التفاصيل البيبلوغرافية
| العنوان: |
Investigation of 3D Patterns on EUV Masks by Means of Scatterometry and Comparison to Numerical Simulations |
| المؤلفون: |
Burger, S., Zschiedrich, L., Pomplun, J., Schmidt, F., Kato, A., Laubis, C., Scholze, F. |
| المصدر: |
Proc. SPIE Vol. 8166 (2011) 81661Q |
| سنة النشر: |
2011 |
| المجموعة: |
Physics (Other) |
| مصطلحات موضوعية: |
Physics - Optics, Physics - Computational Physics |
| الوصف: |
EUV scatterometry is performed on 3D patterns on EUV lithography masks. Numerical simulations of the experimental setup are performed using a rigorous Maxwell solver. Mask geometry is determined by minimizing the difference between experimental results and numerical results for varied geometrical input parameters for the simulations. |
| نوع الوثيقة: |
Working Paper |
| DOI: |
10.1117/12.896839 |
| URL الوصول: |
http://arxiv.org/abs/1110.4760 |
| رقم الانضمام: |
edsarx.1110.4760 |
| قاعدة البيانات: |
arXiv |