Report
Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2
| العنوان: | Modeling of chemical processes in the low pressure capacitive RF discharges in a mixture of Ar/C2H2 |
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| المؤلفون: | Ariskin, D. A., Schweigert, I. V., Alexandrov, A. L., Bogaerts, A., Peeters, F. M. |
| سنة النشر: | 2008 |
| المجموعة: | Physics (Other) |
| مصطلحات موضوعية: | Physics - Plasma Physics |
| الوصف: | We study the properties of a capacitive 13.56 MHz discharge properties with a mixture of Ar/C2H2 taking into account the plasmochemistry and growth of heavy hydrocarbons. A hybrid model was developed to combine the kinetic description for electron motion and the fluid approach for negative and positive ions transport and plasmochemical processes. A significant change of plasma parameters related to injection of 5.8% portion of acetylene in argon was observed and analyzed. We found that the electronegativity of the mixture is about 30%. The densities of negatively and positively charged heavy hydrocarbons are sufficiently large to be precursors for the formation of nanoparticles in the discharge volume. Comment: 11 pages, 14 figures |
| نوع الوثيقة: | Working Paper |
| DOI: | 10.1063/1.3095760 |
| URL الوصول: | http://arxiv.org/abs/0809.2177 |
| رقم الانضمام: | edsarx.0809.2177 |
| قاعدة البيانات: | arXiv |
| DOI: | 10.1063/1.3095760 |
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