Physical insights of body effect and charge degradation in floating-body DRAMs

التفاصيل البيبلوغرافية
العنوان: Physical insights of body effect and charge degradation in floating-body DRAMs
المؤلفون: Gino Giusi
المصدر: Solid-State Electronics. 95:1-7
بيانات النشر: Elsevier BV, 2014.
سنة النشر: 2014
مصطلحات موضوعية: Engineering, Dynamic random access memory, Electronics engineering, law.invention, Electronics engineering, Solid state devices, Band-to-band-tunneling, Degradation mechanism, Device performance, Double gate MOSFET, Dynamic random access memory, Floating body effect, One-transistor DRAM, Trap-assisted-tunneling, Degradation, One-transistor DRAM, law, MOSFET, Materials Chemistry, Electronic engineering, Electrical and Electronic Engineering, Floating body effect, Solid state devices, Trap-assisted-tunneling, business.industry, Transistor, Emphasis (telecommunications), Device performance, Electrical engineering, Charge (physics), Double gate MOSFET, Condensed Matter Physics, Degradation mechanism, Electronic, Optical and Magnetic Materials, Capacitor, Band-to-band-tunneling, business, Random access, Dram
الوصف: Floating Body one transistor Dynamic Random Access Memories (FBRAMs) have been widely studied and proposed in the literature as an alternative for conventional one transistor/one capacitor DRAMs. FBRAM performance depends on charge degradation during READ and HOLD operations and on the body effect during READ operation, the first setting the amount of the residual non-equilibrium charge during READ operation, and the second setting the effectiveness of this residual charge to modulate the source-body barrier during READ operation. In this work it is proposed a simple analytical charge-based compact model for the body-effect in FBRAMs which is able to reproduce device performance in terms of READ Sense Margin and current ratio. Physical insights of the body effect and charge degradation mechanisms, with particular emphasis to their bias dependence, are discussed in detail. Conclusions can be useful for the choice and the optimization of the bias in FBRAMs. All the discussion is supported by two-dimensional drift–diffusion device simulation on a template double-gate MOSFET.
تدمد: 0038-1101
DOI: 10.1016/j.sse.2014.02.015
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fc6f19f88b5ab4f12470a4a361ae8a34
https://doi.org/10.1016/j.sse.2014.02.015
Rights: CLOSED
رقم الانضمام: edsair.doi.dedup.....fc6f19f88b5ab4f12470a4a361ae8a34
قاعدة البيانات: OpenAIRE
الوصف
تدمد:00381101
DOI:10.1016/j.sse.2014.02.015