Enhanced permeability dielectric FeCo/Al2O3 multilayer thin films with tailored properties deposited by magnetron sputtering on silicon
| العنوان: | Enhanced permeability dielectric FeCo/Al2O3 multilayer thin films with tailored properties deposited by magnetron sputtering on silicon |
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| المؤلفون: | Xue Zhao, Claudiu V. Falub, Pietambaram Srinivas, Jan Ambrosini, Oguz Yildirim, Ondrej Caha, Mojmír Meduňa, Rachid Hida, Hans J. Hug, Hartmut Rohrmann |
| المساهمون: | Laboratory for Mechanics of Materials and Nanostructures [Thun] (EMPA), Faculty of Science [Brno] (SCI / MUNI), Masaryk University [Brno] (MUNI), Commissariat à l'énergie atomique et aux énergies alternatives - Laboratoire d'Electronique et de Technologie de l'Information (CEA-LETI), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA), Swiss Federal Commission for Technology and Innovation (CTI-Project) [18940.2 PFNM-NM], CEITEC Nano Research Infrastructure (MEYS CR) [LM2015041], MEYS of the Czech Republic under the project CEITEC 2020 [LQ1601] |
| المصدر: | AIP Advances AIP Advances, American Institute of Physics-AIP Publishing LLC, 2019, 9 (3), ⟨10.1063/1.5079477⟩ AIP Advances, 2019, 9 (3), ⟨10.1063/1.5079477⟩ AIP Advances, Vol 9, Iss 3, Pp 035243-035243-6 (2019) |
| بيانات النشر: | HAL CCSD, 2019. |
| سنة النشر: | 2019 |
| مصطلحات موضوعية: | 010302 applied physics, Materials science, General Physics and Astronomy, 02 engineering and technology, Sputter deposition, Coercivity, 021001 nanoscience & nanotechnology, Microstructure, Magnetic hysteresis, 01 natural sciences, lcsh:QC1-999, [SPI]Engineering Sciences [physics], Ferromagnetism, Sputtering, Remanence, 0103 physical sciences, Thin film, Composite material, 0210 nano-technology, lcsh:Physics |
| الوصف: | International audience; We have studied the structural and magnetic properties of enhanced-permeability-dielectric FeCo/Al2O3-multilayer thin films deposited on 8 ''-Si wafers in an industrial magnetron sputtering system. The EPD-multilayers consist of 25 periods of alternating nanometer-thick FeCo-layers deposited by DC sputtering from a Fe60Co40 target and Al2O3-interlayers deposited by RF sputtering from an Al2O3 target. We tuned the magnetic properties of these thin films by varying the thickness of FeCo-layers from 1.1nm to 2.1nm, while the thickness of Al2O3-interlayers remained unchanged (3.5nm). The formation of layers of disconnected FeCo-nanoparticles separated by an Al2O3-matrix was revealed by grazing incidence small angle X-ray-scattering. Further insight into the microstructure of these layers was obtained from X-ray-reflectivity, highly asymmetric-X-ray-diffraction and non-coplanar grazing-incidence-diffraction. The Fe/Co ratio in the FeCo-layers obtained from X-ray-fluorescence measurements was (59 +/- 1)/(41 +/- 1), which is in very good agreement with the nominal value in the Fe60C40 target. Using the standing wave technique we found that most of the Fe and Co atoms were located inside the polycrystalline grains, except for a small fraction that diffused into the Al2O3-matrix, and that the thinner the FeCo-layers thickness the higher the fraction of diffused atoms with respect to those in the grains. Zero-field-cooled, field-cooled, and hysteresis (B-H) and (M-H) measurements showed that the FeCo/Al2O3-multilayers with FeCo-layers thinner than 1.7-1.8 nm exhibit superparamagnetic behavior (no coercivity and remanence) at room temperature with peak relative low-field permeability up to 887. By exceeding this critical thickness, the neighboring FeCo-aggregates started to coalesce, and this led to the ferromagnetic behavior revealed by a finite coercivity and remanence in the hysteresis loops. |
| اللغة: | English |
| تدمد: | 2158-3226 |
| DOI: | 10.1063/1.5079477⟩ |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::9ae7457a740215c938b36017d59882f6 https://hal-cea.archives-ouvertes.fr/cea-02186483 |
| Rights: | OPEN |
| رقم الانضمام: | edsair.doi.dedup.....9ae7457a740215c938b36017d59882f6 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 21583226 |
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| DOI: | 10.1063/1.5079477⟩ |