Hybrid gold/DNA nanowire circuit with sub-10 nm nanostructure arrays

التفاصيل البيبلوغرافية
العنوان: Hybrid gold/DNA nanowire circuit with sub-10 nm nanostructure arrays
المؤلفون: Byungyou Hong, Deok Ho Kim, Jonathan H. Tsui, Hye Bin Park, Jong Seob Choi, Hyungjin Kim
المصدر: Microsystems & Nanoengineering, Vol 6, Iss 1, Pp 1-8 (2020)
بيانات النشر: Springer Science and Business Media LLC, 2020.
سنة النشر: 2020
مصطلحات موضوعية: Materials science, Nanostructure, lcsh:T, Materials Science (miscellaneous), Nanowire, Nanoparticle, Nanotechnology, 02 engineering and technology, Substrate (electronics), 010402 general chemistry, 021001 nanoscience & nanotechnology, Condensed Matter Physics, lcsh:Technology, 01 natural sciences, Industrial and Manufacturing Engineering, Atomic and Molecular Physics, and Optics, 0104 chemical sciences, Surface coating, lcsh:TA1-2040, Electrical and Electronic Engineering, lcsh:Engineering (General). Civil engineering (General), 0210 nano-technology, Nanoscopic scale, Lithography, Plasma ashing
الوصف: We report on a simple and efficient method for the selective positioning of Au/DNA hybrid nanocircuits using a sequential combination of electron-beam lithography (EBL), plasma ashing, and a molecular patterning process. The nanostructures produced by the EBL and ashing process could be uniformly formed over a 12.6 in2 substrate with sub-10 nm patterning with good pattern fidelity. In addition, DNA molecules were immobilized on the selectively nanopatterned regions by alternating surface coating procedures of 3-(aminopropyl)triethoxysilane (APS) and diamond like carbon (DLC), followed by deposition of DNA molecules into a well-defined single DNA nanowire. These single DNA nanowires were used not only for fabricating Au/DNA hybrid nanowires by the conjugation of Au nanoparticles with DNA, but also for the formation of Au/DNA hybrid nanocircuits. These nanocircuits prepared from Au/DNA hybrid nanowires demonstrate conductivities of up to 4.3 × 105 S/m in stable electrical performance. This selective and precise positioning method capable of controlling the size of nanostructures may find application in making sub-10 nm DNA wires and metal/DNA hybrid nanocircuits. A fabrication method for manufacturing nanoscale circuits with high spatial resolution could provide a boost for high-sensitivity molecular detection devices. Electron-beam lithography (EBL) is a powerful tool for patterning nanowire circuits, but its performance declines at spatial scales of less than 10 nanometers. Researchers led by Dr. Deok-Ho Kim at the Johns Hopkins University and Dr. Hyung Jin Kim at the Gumi Electronics and information Technology Research Institute have overcome this limitation by coupling EBL with a plasma ashing procedure. Using this approach, they were able to precisely pattern nanostructures in a silicon substrate. They subsequently performed a series of chemical modifications that enabled them to couple DNA strands to these patterns, which in turn served as a template for gold nanowires. This strategy could accelerate the production of nanocircuits for biomolecular detection in diagnostics and other applications.
تدمد: 2055-7434
DOI: 10.1038/s41378-020-00202-5
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::545d5b6a1b99019d4ae5b6ba0362e875
https://doi.org/10.1038/s41378-020-00202-5
Rights: OPEN
رقم الانضمام: edsair.doi.dedup.....545d5b6a1b99019d4ae5b6ba0362e875
قاعدة البيانات: OpenAIRE
الوصف
تدمد:20557434
DOI:10.1038/s41378-020-00202-5