LBIC measurement optimization to detect laser annealing induced defects in Si
| العنوان: | LBIC measurement optimization to detect laser annealing induced defects in Si |
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| المؤلفون: | H. Etienne, Yannick Larmande, Thierry Sarnet, V. Vervisch, Frank Torregrosa, Marc Sentis, Philippe Delaporte, G. Coustillier |
| المساهمون: | Laboratoire Lasers, Plasmas et Procédés photoniques (LP3), Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), Institut des Matériaux, de Microélectronique et des Nanosciences de Provence (IM2NP), Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS)-Aix Marseille Université (AMU), Ion Beam Service, entreprise, Ion Beam Services, industriel, Aix Marseille Université (AMU)-Centre National de la Recherche Scientifique (CNRS), Aix Marseille Université (AMU)-Université de Toulon (UTLN)-Centre National de la Recherche Scientifique (CNRS), Ion Beam Services (IBS) |
| المصدر: | Materials Science and Engineering: B Materials Science and Engineering: B, Elsevier, 2012, 177 (18), pp.1628-1632. ⟨10.1016/j.mseb.2012.08.018⟩ Materials Science and Engineering: B, 2012, 177 (18), pp.1628-1632. ⟨10.1016/j.mseb.2012.08.018⟩ |
| بيانات النشر: | HAL CCSD, 2012. |
| سنة النشر: | 2012 |
| مصطلحات موضوعية: | Materials science, Annealing (metallurgy), 02 engineering and technology, medicine.disease_cause, 01 natural sciences, Optics, 0103 physical sciences, medicine, Light beam, General Materials Science, Electrical measurements, Irradiation, Penetration depth, 010302 applied physics, Photocurrent, business.industry, Mechanical Engineering, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Semiconductor, Mechanics of Materials, [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, Optoelectronics, 0210 nano-technology, business, Ultraviolet |
| الوصف: | International audience; Because of the short penetration depth of ultraviolet (UV) in semiconductor, the realization of UV sensors requires the reduction of the junction thickness. Excimer laser annealing (ELA) is a new annealing technical allowing to achieve a thin layer ( |
| اللغة: | English |
| تدمد: | 0921-5107 |
| DOI: | 10.1016/j.mseb.2012.08.018⟩ |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::536207b2f57253139b906643ce95bd36 https://hal.archives-ouvertes.fr/hal-01418613 |
| Rights: | CLOSED |
| رقم الانضمام: | edsair.doi.dedup.....536207b2f57253139b906643ce95bd36 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 09215107 |
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| DOI: | 10.1016/j.mseb.2012.08.018⟩ |