Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma
| العنوان: | Plasma-enhanced ALD of TiO2 using a novel cyclopentadienyl alkylamido precursor [Ti(CPMe)(NMe2)3] and O2 plasma |
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| المؤلفون: | Fred Roozeboom, SE Stephen Potts, Simon A. Rushworth, van de Mcm Richard Sanden, A Anitha Sarkar, Wmm Erwin Kessels |
| المساهمون: | Plasma & Materials Processing, Atomic scale processing |
| المصدر: | Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA, 385-393 STARTPAGE=385;ENDPAGE=393;TITLE=Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA |
| سنة النشر: | 2010 |
| مصطلحات موضوعية: | Anatase, Materials science, Cyclopentadienyl complex, Inorganic chemistry, Remote plasma, Thin film, Atmospheric temperature range, Stoichiometry, Amorphous solid, Titanium oxide |
| الوصف: | Titanium oxide thin films of both amorphous and anatase morphologies have been deposited using remote plasma ALD over a wide temperature range (100-350 °C), using a novel heteroleptic alkylamido precursor Ti(CpMe)(NMe2)3. A high growth per cycle (GPC) of 0.07-0.08 nm (50 % higher than the GPC obtained with most other organometallic precursors). Films obtained were stoichiometric and of high compositional purity. |
| اللغة: | English |
| تدمد: | 1938-6737 |
| DOI: | 10.1149/1.3485274 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::4ce457e6c052e11b8056258f3af637a4 https://doi.org/10.1149/1.3485274 |
| Rights: | CLOSED |
| رقم الانضمام: | edsair.doi.dedup.....4ce457e6c052e11b8056258f3af637a4 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 19386737 |
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| DOI: | 10.1149/1.3485274 |