Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: Design and characterization
| العنوان: | Low-loss micro-resonator filters fabricated in silicon by CMOS-compatible lithographic techniques: Design and characterization |
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| المؤلفون: | Paolo Minzioni, Ilaria Cristiani, Maryse Fournier, Guido Giuliani, Lee Carroll, Viviane Muffato, Cosimo Lacava, Silvio Abrate, Enrico Temporiti, Riccardo Marchetti, Valerio Vitali, Roberto Gaudino |
| المصدر: | Applied Sciences, Vol 7, Iss 2, p 174 (2017) Applied Sciences; Volume 7; Issue 2; Pages: 174 |
| بيانات النشر: | MDPI AG, 2017. |
| سنة النشر: | 2017 |
| مصطلحات موضوعية: | Micro-rings, Materials science, Silicon photonics, Silicon on insulator, Optical components, 02 engineering and technology, Hardware_PERFORMANCEANDRELIABILITY, lcsh:Technology, lcsh:Chemistry, Resonator, 020210 optoelectronics & photonics, Etching (microfabrication), integrated filters, optical losses, optical components, integrated waveguides, 0202 electrical engineering, electronic engineering, information engineering, Electronic engineering, Hardware_INTEGRATEDCIRCUITS, Integrated waveguides, Insertion loss, General Materials Science, Optical filter, Integrated filters, Optical losses, Applied Mathematics, Instrumentation, Lithography, lcsh:QH301-705.5, Fluid Flow and Transfer Processes, business.industry, lcsh:T, Process Chemistry and Technology, General Engineering, lcsh:QC1-999, Computer Science Applications, CMOS, lcsh:Biology (General), lcsh:QD1-999, lcsh:TA1-2040, Optoelectronics, business, lcsh:Engineering (General). Civil engineering (General), lcsh:Physics |
| الوصف: | Optical resonators are fundamental building-blocks for the development of Si-photonics-integrated circuits, as tunable on-chip optical filters. In addition to the specific spectral shape, which may vary according to a particular application, extremely low losses from these devices are a crucial requirement. In the current state-of-the-art devices, most low-loss filters have only been demonstrated by exploiting ad hoc lithographic and etching techniques, which are not compatible with the standard CMOS (complementary metal-oxide semiconductor) process-flow available at Si-photonic foundries. In this paper, we describe the design and optimization of optical micro-resonators, based on Si-waveguides with a height lower than the standard ones (i.e., less than 220 nm), prepared on SOI (silicon on insulator) platform, which allow the realization of high-performance optical filters with an insertion loss lower than 1 dB, using only previously validated lithographic etch-depths. |
| وصف الملف: | application/pdf; text |
| اللغة: | English |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_dedup___::40f1a0a170c2b7e7e3d5ccb216ff7c9e http://hdl.handle.net/11583/2671507 |
| Rights: | OPEN |
| رقم الانضمام: | edsair.doi.dedup.....40f1a0a170c2b7e7e3d5ccb216ff7c9e |
| قاعدة البيانات: | OpenAIRE |
| الوصف غير متاح. |