Laterally controlled ultra-low energy ion implantation using electrostatic masking
| العنوان: | Laterally controlled ultra-low energy ion implantation using electrostatic masking |
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| المؤلفون: | M. Auge, F. Junge, H. Hofsäss |
| المصدر: | Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 512:96-101 |
| بيانات النشر: | Elsevier BV, 2022. |
| سنة النشر: | 2022 |
| مصطلحات موضوعية: | Nuclear and High Energy Physics, Instrumentation |
| تدمد: | 0168-583X |
| DOI: | 10.1016/j.nimb.2021.12.001 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::fddb9a6c5428962ef10921ba07a47697 https://doi.org/10.1016/j.nimb.2021.12.001 |
| Rights: | CLOSED |
| رقم الانضمام: | edsair.doi...........fddb9a6c5428962ef10921ba07a47697 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 0168583X |
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| DOI: | 10.1016/j.nimb.2021.12.001 |