Growth of 28Si Quantum Well Layers for Qubits by a Hybrid MBE/CVD Technique

التفاصيل البيبلوغرافية
العنوان: Growth of 28Si Quantum Well Layers for Qubits by a Hybrid MBE/CVD Technique
المؤلفون: Yujia Liu, Kevin-Peter Gradwohl, Chen-HSun Lu, Yuji Yamamoto, Thilo Remmele, Cedric Corley-Wiciak, Thomas Teubner, Carsten Richter, Martin Albrecht, Torsten Boeck
المصدر: ECS Journal of Solid State Science and Technology. 12:024006
بيانات النشر: The Electrochemical Society, 2023.
سنة النشر: 2023
مصطلحات موضوعية: Electronic, Optical and Magnetic Materials
الوصف: Isotopically enriched 28Si quantum well layers in SiGe/Si/SiGe heterostructures are an excellent material platform for electron spin qubits. In this work, we report the fabrication of 28SiGe/28Si/28SiGe heterostructures for qubits by a hybrid molecular beam epitaxy (MBE) / chemical vapour deposition (CVD) growth, where the thick relaxed SiGe substrates are realised by a reduced-pressure CVD and the 28SiGe/28Si/28SiGe stacks are grown by MBE Here, we achieve a fully strained 28Si quantum well layer in such heterostructures with a 29Si concentration as low as 200 ppm within the MBE grown layers. It concludes that 29Si primarily originates from the residual natural Si vapour in the MBE chamber. A reliable surface preparation combining ex situ wet chemical cleaning and in situ annealing and atomic hydrogen irradiation offers epitaxy ready CVD grown SiGe substrates with low carbon and oxygen impurities. Furthermore, we also present our studies about the growth temperature effect on the misfit dislocation formation in this heterostructure. It shows that the misfit dislocation formation is significantly suppressed at a low MBE growth temperature, such as 350 °C.
تدمد: 2162-8777
2162-8769
DOI: 10.1149/2162-8777/acb734
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ef418fd7bf73ea7ea183e282c16f46a7
https://doi.org/10.1149/2162-8777/acb734
Rights: CLOSED
رقم الانضمام: edsair.doi...........ef418fd7bf73ea7ea183e282c16f46a7
قاعدة البيانات: OpenAIRE
الوصف
تدمد:21628777
21628769
DOI:10.1149/2162-8777/acb734