Optimization of SiC MESFET for High Power and High Frequency Applications

التفاصيل البيبلوغرافية
العنوان: Optimization of SiC MESFET for High Power and High Frequency Applications
المؤلفون: Niklas Rorsman, Björn Magnusson, Niclas Ejebjörk, J. Peder Bergman, Herbert Zirath
المصدر: Materials Science Forum. :629-632
بيانات النشر: Trans Tech Publications, Ltd., 2011.
سنة النشر: 2011
مصطلحات موضوعية: Materials science, business.industry, Oscillation, Mechanical Engineering, Transconductance, Doping, Electrical engineering, Condensed Matter Physics, Aspect ratio (image), Power (physics), Mechanics of Materials, Optoelectronics, General Materials Science, MESFET, Channel (broadcasting), business, Current density
الوصف: SiC MESFETs were scaled both laterally and vertically to optimize high frequency and high power performance. Two types of epi-stacks of SiC MESFETs were fabricated and measured. The first type has a doping of 3×1017 cm-3 in the channel and the second type has higher doping (5×1017 cm-3) in the channel. The higher doping allows the channel to be thinner for the same current density and therefore a reduction of the aspect ratio is possible. This could impede short channel effects. For the material with higher channel doping the maximum transconductance is 58 mS/mm. The maximum current gain frequency, fT, and maximum frequency of oscillation, fmax, is 9.8 GHz and 23.9 GHz, and 12.4 GHz and 28.2 GHz for the MESFET with lower doped channel and higher doping, respectively.
تدمد: 1662-9752
DOI: 10.4028/www.scientific.net/msf.679-680.629
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::ebead73b5883b1ea635f0b5d6123b782
https://doi.org/10.4028/www.scientific.net/msf.679-680.629
Rights: CLOSED
رقم الانضمام: edsair.doi...........ebead73b5883b1ea635f0b5d6123b782
قاعدة البيانات: OpenAIRE
الوصف
تدمد:16629752
DOI:10.4028/www.scientific.net/msf.679-680.629