Electrical Characteristics of HfO2-Al2O3 Dielectric Thin Films Grown by Atomic-Layer-Deposition in Metal-Insulator-Metal Capacitor Configuration
| العنوان: | Electrical Characteristics of HfO2-Al2O3 Dielectric Thin Films Grown by Atomic-Layer-Deposition in Metal-Insulator-Metal Capacitor Configuration |
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| المؤلفون: | Ming-Hsuan Chien, Yan-Kai Chiou, Tai-Bor Wu |
| المصدر: | ECS Meeting Abstracts. :816-816 |
| بيانات النشر: | The Electrochemical Society, 2007. |
| سنة النشر: | 2007 |
| الوصف: | not Available. |
| تدمد: | 2151-2043 |
| DOI: | 10.1149/ma2007-01/17/816 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::de855c71603adf3456a82545c9ee5cd6 https://doi.org/10.1149/ma2007-01/17/816 |
| Rights: | CLOSED |
| رقم الانضمام: | edsair.doi...........de855c71603adf3456a82545c9ee5cd6 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 21512043 |
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| DOI: | 10.1149/ma2007-01/17/816 |