We report on the development of a prototype polarization tag based system for detecting chemical vapors. The system primarily consists of two components, a chemically sensitive tag that experiences a change in its optical polarization properties when exposed to a specific chemical of interest, and an optical imaging polarimeter that is used to measure the polarization properties of the tags. Although the system concept could be extended to other chemicals, for the initial system prototype presented here the tags were developed to be sensitive to hydrogen fluoride (HF) vapors. HF is used in many industrial processes but is highly toxic and thus monitoring for its presence and concentration is often of interest for personnel and environmental safety. The tags are periodic multilayer structures that are produced using standard photolithographic processes. The polarimetric imager has been designed to measure the degree of linear polarization reflected from the tags in the short wave infrared. By monitoring the change in the reflected polarization signature from the tags, the polarimeter can be used to determine if the tag was exposed to HF gas. In this paper, a review of the system development effort and preliminary test results are presented and discussed, as well as our plan for future work.