Cleaning-Free Deposition System Using Pulsed-Plasma CVD under Near-Atmospheric Pressure for Highly Crystallized Poly-Si Thin Films on Plastic Films
| العنوان: | Cleaning-Free Deposition System Using Pulsed-Plasma CVD under Near-Atmospheric Pressure for Highly Crystallized Poly-Si Thin Films on Plastic Films |
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| المؤلفون: | Mitsutaka Matsumoto, Yohei Inayoshi, Shogo Murashige, Hirokazu Fukidome, Maki Suemitsu, Setsuo Nakajima, Tsuyoshi Uehara, Yasutake Toyosihima |
| المصدر: | ECS Meeting Abstracts. :2097-2097 |
| بيانات النشر: | The Electrochemical Society, 2009. |
| سنة النشر: | 2009 |
| الوصف: | not Available. |
| تدمد: | 2151-2043 |
| DOI: | 10.1149/ma2009-02/24/2097 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::d39a9ae006d18ecdb33fbec3e64fd0de https://doi.org/10.1149/ma2009-02/24/2097 |
| Rights: | CLOSED |
| رقم الانضمام: | edsair.doi...........d39a9ae006d18ecdb33fbec3e64fd0de |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 21512043 |
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| DOI: | 10.1149/ma2009-02/24/2097 |