Growth and Thermal Stability of SiGe/Si Superlattices on Bulk Si Wafers

التفاصيل البيبلوغرافية
العنوان: Growth and Thermal Stability of SiGe/Si Superlattices on Bulk Si Wafers
المؤلفون: T. Billon, Thomas Ernst, Anne-Marie Papon, J. P. Colonna, Jean-Michel Hartmann
المصدر: ECS Transactions. 16:341-351
بيانات النشر: The Electrochemical Society, 2008.
سنة النشر: 2008
مصطلحات موضوعية: Materials science, business.industry, Superlattice, Optoelectronics, Thermal stability, Wafer, business
الوصف: Deals with (i) the growth and thermal stability of large number or periods SiGe/Si superlattices on bulk Si and (ii) the impact of B and P doping and of C alloying of SiGe on the growth kinetics of SiGe/Si superlattices.
تدمد: 1938-6737
1938-5862
DOI: 10.1149/1.2986792
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::cdaa61f184a25928d7e1d801cf57f024
https://doi.org/10.1149/1.2986792
Rights: CLOSED
رقم الانضمام: edsair.doi...........cdaa61f184a25928d7e1d801cf57f024
قاعدة البيانات: OpenAIRE
الوصف
تدمد:19386737
19385862
DOI:10.1149/1.2986792