Microstructure and Chemistry of Nonstoichiometric (Ba,Sr)TiO3 Thin Films Deposited by Metalorganic Chemical Vapor Deposition
| العنوان: | Microstructure and Chemistry of Nonstoichiometric (Ba,Sr)TiO3 Thin Films Deposited by Metalorganic Chemical Vapor Deposition |
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| المؤلفون: | Richard D. Leapman, Igor Levin, Debra L. Kaiser |
| المصدر: | Journal of Materials Research. 15:1433-1436 |
| بيانات النشر: | Springer Science and Business Media LLC, 2000. |
| سنة النشر: | 2000 |
| مصطلحات موضوعية: | Materials science, Hybrid physical-chemical vapor deposition, Mechanical Engineering, Analytical chemistry, Combustion chemical vapor deposition, Condensed Matter Physics, Electron beam physical vapor deposition, Pulsed laser deposition, Amorphous solid, Carbon film, Mechanics of Materials, General Materials Science, Grain boundary, Thin film |
| الوصف: | The microstructure and chemistry of (Ba,Sr)TiO3 thin films deposited on Pt/SiO2/Si substrates by metalorganic chemical vapor deposition were studied using highresolution transmission electron microscopy and quantitative spectrum imaging in electron energy loss spectroscopy. The grain boundaries in all films with overall Ti content ranging from 50.7% to 53.4% exhibit a significant increase in Ti/Ba ratio as compared to the grain interiors. The results suggest that the deviations of Ti/(Ba + Sr) ratio from the stoichiometric value of unity are accommodated by the creation of Ba/Sr vacancies, which segregate to the grain boundary regions. The films with Ti contents equal to or greater than 52% additionally contained an amorphous Ti-rich phase at some grain boundaries and multiple grain junctions; the amount of this phase increases with increasing overall Ti content. The analysis indicates that the amorphous phase can only partially account for the significant drop in dielectric permittivity accompanying increases in the Ti/(Ba + Sr) ratio. |
| تدمد: | 2044-5326 0884-2914 |
| DOI: | 10.1557/jmr.2000.0207 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::c8832214460d6952cbf15e9269006973 https://doi.org/10.1557/jmr.2000.0207 |
| Rights: | CLOSED |
| رقم الانضمام: | edsair.doi...........c8832214460d6952cbf15e9269006973 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 20445326 08842914 |
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| DOI: | 10.1557/jmr.2000.0207 |