Microstructure and properties of nanocrystalline Cu–Ta thin films prepared by direct current magnetron sputtering
| العنوان: | Microstructure and properties of nanocrystalline Cu–Ta thin films prepared by direct current magnetron sputtering |
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| المؤلفون: | Jiaoyan Dai, Li-jun Zhang, Yongqiang Chang, Shengwang Yu, Mingdong Bao, Wu Tian |
| المصدر: | Surface Engineering. 37:160-168 |
| بيانات النشر: | Informa UK Limited, 2020. |
| سنة النشر: | 2020 |
| مصطلحات موضوعية: | 010302 applied physics, Materials science, Direct current magnetron sputtering, Silicon, business.industry, Doping, chemistry.chemical_element, 02 engineering and technology, Surfaces and Interfaces, Sputter deposition, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Microstructure, 01 natural sciences, Nanocrystalline material, Surfaces, Coatings and Films, Crystal, chemistry, 0103 physical sciences, Materials Chemistry, Optoelectronics, Thin film, 0210 nano-technology, business |
| الوصف: | Nanocrystalline (NC) Cu–Ta thin films were successfully fabricated by unbalanced magnetron sputtering on crystal silicon and glass substrates. Thin films doped with different Ta contents were prepa... |
| تدمد: | 1743-2944 0267-0844 |
| DOI: | 10.1080/02670844.2020.1748338 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::a6e9f98859bbbee902e41cd748daeb10 https://doi.org/10.1080/02670844.2020.1748338 |
| رقم الانضمام: | edsair.doi...........a6e9f98859bbbee902e41cd748daeb10 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 17432944 02670844 |
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| DOI: | 10.1080/02670844.2020.1748338 |