On the influence of Ni(Pt)Si thin film formation on agglomeration threshold temperature and its impact on 3D imaging technology integration

التفاصيل البيبلوغرافية
العنوان: On the influence of Ni(Pt)Si thin film formation on agglomeration threshold temperature and its impact on 3D imaging technology integration
المؤلفون: M. Grégoire, F. Morris Anak, S. Verdier, K. Dabertrand, S. Guillemin, D. Mangelinck
المصدر: Microelectronic Engineering. :111937
بيانات النشر: Elsevier BV, 2023.
سنة النشر: 2023
مصطلحات موضوعية: Electrical and Electronic Engineering, Condensed Matter Physics, Atomic and Molecular Physics, and Optics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials
تدمد: 0167-9317
DOI: 10.1016/j.mee.2023.111937
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::6881c7757356f5b85d08563671fbf1b7
https://doi.org/10.1016/j.mee.2023.111937
Rights: CLOSED
رقم الانضمام: edsair.doi...........6881c7757356f5b85d08563671fbf1b7
قاعدة البيانات: OpenAIRE
الوصف
تدمد:01679317
DOI:10.1016/j.mee.2023.111937