Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists
| العنوان: | Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists |
|---|---|
| المؤلفون: | Arturo N. Medina, Allen G. Timko, Janet M. Kometani, John J. Biafore, Sydney G. Slater, R. S. Hutton, Allen H. Gabor, F. M. Houlihan |
| المصدر: | Journal of Photopolymer Science and Technology. 11:419-429 |
| بيانات النشر: | Technical Association of Photopolymers, Japan, 1998. |
| سنة النشر: | 1998 |
| مصطلحات موضوعية: | chemistry.chemical_compound, Materials science, Polymers and Plastics, Resist, chemistry, Organic Chemistry, Polymer chemistry, Materials Chemistry, Photochemistry, Single layer, Norbornene |
| تدمد: | 1349-6336 0914-9244 |
| DOI: | 10.2494/photopolymer.11.419 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::3b707325da2bdb0387defa132c4e093a https://doi.org/10.2494/photopolymer.11.419 |
| Rights: | OPEN |
| رقم الانضمام: | edsair.doi...........3b707325da2bdb0387defa132c4e093a |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 13496336 09149244 |
|---|---|
| DOI: | 10.2494/photopolymer.11.419 |