Hydrogen migration in wet-thermally grown silicon dioxide layers due to high dose 15N ion beam irradiation

التفاصيل البيبلوغرافية
العنوان: Hydrogen migration in wet-thermally grown silicon dioxide layers due to high dose 15N ion beam irradiation
المؤلفون: F. Herrmann, K. Maser, A. Weidinger, U. Beck, U. Mohr, D. Grambole, R. Grötzschel, J. Krauser, K.H. Ecker, R. Leihkauf
المصدر: Microelectronic Engineering. 48:139-142
بيانات النشر: Elsevier BV, 1999.
سنة النشر: 1999
مصطلحات موضوعية: Silicon, Hydrogen, Chemistry, Silicon dioxide, Analytical chemistry, chemistry.chemical_element, Condensed Matter Physics, Nitrogen, Atomic and Molecular Physics, and Optics, Spectral line, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Ion, chemistry.chemical_compound, Wavelength, Ellipsometry, Electrical and Electronic Engineering
الوصف: Three effects have been observed in wet-thermally grown SiO 2 Si structures under bombardement with energetic 15N ions: 1. (1) Out-diffusion of H from the SiO 2 Si system through the surface, 2. (2) Accumulation of H at the SiO 2 Si interface, 3. (3) Changes in the optical fingerprint spectra of Ψ and Δ in dependence on λ (wavelength) obtained by ellipsometric measurements.
تدمد: 0167-9317
DOI: 10.1016/s0167-9317(99)00356-1
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::31a764d7ab0dc71a39068d765170b396
https://doi.org/10.1016/s0167-9317(99)00356-1
Rights: CLOSED
رقم الانضمام: edsair.doi...........31a764d7ab0dc71a39068d765170b396
قاعدة البيانات: OpenAIRE
الوصف
تدمد:01679317
DOI:10.1016/s0167-9317(99)00356-1