Electrodeposition of p-Cu2O Layers on Co/p-Si Planar Structures

التفاصيل البيبلوغرافية
العنوان: Electrodeposition of p-Cu2O Layers on Co/p-Si Planar Structures
المؤلفون: A. D. C. Viegas, André A. Pasa, Vinicius C. Zoldan, Sebastiao G. Dos Santos, Vagner Stenger, D. L. da Silva, R. G. Delatorre
المصدر: ECS Transactions. 23:77-83
بيانات النشر: The Electrochemical Society, 2009.
سنة النشر: 2009
مصطلحات موضوعية: Crystallography, Planar, Materials science
الوصف: The electrodeposition of p-Cu2O layers on Co/p-Si planar structures for potential application as p/metal/p metal base transistors were investigated. The deposits were prepared from electrolytes containing lactic acid and copper sulphate and characterized by Rutherford Backscattering Spectrometry (RBS), X - Ray Diffraction (XRD), and Transmission Electron Microscopy (TEM). The formation of Cu2O/Co Schottky interfaces was confirmed by electrical measurements.
تدمد: 1938-6737
1938-5862
DOI: 10.1149/1.3183704
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::18e817154b9e6cf83cbfb69c11c269a6
https://doi.org/10.1149/1.3183704
Rights: CLOSED
رقم الانضمام: edsair.doi...........18e817154b9e6cf83cbfb69c11c269a6
قاعدة البيانات: OpenAIRE
الوصف
تدمد:19386737
19385862
DOI:10.1149/1.3183704