Electron Cyclotron Resonance Microwave Discharge for Oxide Deposition Using Tetraethoxysilane
| العنوان: | Electron Cyclotron Resonance Microwave Discharge for Oxide Deposition Using Tetraethoxysilane |
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| المؤلفون: | J. F. Miner, C. S. Pai, P. D. Foo |
| المصدر: | Journal of The Electrochemical Society. 139:850-856 |
| بيانات النشر: | The Electrochemical Society, 1992. |
| سنة النشر: | 1992 |
| مصطلحات موضوعية: | Renewable Energy, Sustainability and the Environment, Chemistry, Analytical chemistry, Oxide, Crystal growth, Dielectric, Plasma, Condensed Matter Physics, Electron cyclotron resonance, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Materials Chemistry, Electrochemistry, Deposition (phase transition), Thin film, Microwave |
| الوصف: | In this paper, results of the dielectric oxide films deposited using tetraethoxysilane (TEOS)+O 2 chemistry in a reactor with electron cyclotron resonance (ECR) microwave discharge are presented. In the reactor, O 2 gas is introduced into the plasma chamber and TEOS is introduced into the deposition chamber, which is downstream of the plasma |
| تدمد: | 1945-7111 0013-4651 |
| DOI: | 10.1149/1.2069315 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::0e52a518f61355a7995d9f4220a8e205 https://doi.org/10.1149/1.2069315 |
| Rights: | CLOSED |
| رقم الانضمام: | edsair.doi...........0e52a518f61355a7995d9f4220a8e205 |
| قاعدة البيانات: | OpenAIRE |
| تدمد: | 19457111 00134651 |
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| DOI: | 10.1149/1.2069315 |