Sub-10 nm advanced finfet design for different applications in various vdd and temperature operation ranges

التفاصيل البيبلوغرافية
العنوان: Sub-10 nm advanced finfet design for different applications in various vdd and temperature operation ranges
المؤلفون: Sun-hye Kim, Byungha Choi, Soyoun Kim, S. D. Kwon, Jinhong Kim, Y. Yasuda-Masuoka, Byung-Gook Park
المصدر: 2019 Symposium on VLSI Technology.
بيانات النشر: IEEE, 2019.
سنة النشر: 2019
مصطلحات موضوعية: Reduction (complexity), Materials science, business.industry, law, MOSFET, Transistor, Optoelectronics, business, Energy (signal processing), Voltage, law.invention
الوصف: An advanced FinFET design is identified to improve both variation and minimum operation voltage $(V_{\text{min}})$ in various temperature and supply voltage $(V_{\text{dd}})$ ranges, using sub-10 nm FinFET transistors. Through a clarification of each electrical parameter's impact on both variation and operation voltage, a suitable FinFET design is successfully demonstrated to reduce $I_{\text{eff}}$ variation by 0.4x, as well as Idoff variation by 0.8x in various $V_{\text{dd}}$ ranges. This paper also provides Tr. design to improve $V_{\text{min}}$ by 35 mV with the switching energy 0.87x reduction.
DOI: 10.23919/vlsit.2019.8776531
URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::06c0a1a9887a703b2ca1702cabc8e998
https://doi.org/10.23919/vlsit.2019.8776531
رقم الانضمام: edsair.doi...........06c0a1a9887a703b2ca1702cabc8e998
قاعدة البيانات: OpenAIRE
الوصف
DOI:10.23919/vlsit.2019.8776531