التفاصيل البيبلوغرافية
| العنوان: |
Thermodynamic analysis for nonpolar III-nitride surfaces under metalorganic vapor-phase epitaxy conditions. |
| المؤلفون: |
Tsunashi Shimizu, Yuki Seta, Toru Akiyama, Abdul Muizz Pradipto, Kohji Nakamura, Tomonori Ito, Akira Kusaba, Yoshihiro Kangawa |
| المصدر: |
Japanese Journal of Applied Physics; 2/1/2020, Vol. 59 Issue 2, p1-1, 1p |
| مستخلص: |
We perform an improved thermodynamic analysis of nonpolar (100) and (110) surfaces for AlN and GaN to elucidate the difference in growth condition among various types of nonpolar and polar surfaces during metalorganic vapor-phase epitaxy (MOVPE). It is found that the maximum growth temperature of (100) surface is lower than those of (0001) and (000) surfaces. In contrast, the maximum growth temperature of (110) surface is high compared to that of (0001) surface. This orientation dependence corresponds to the relative stability between polar and nonpolar reconstructed surfaces. These results offer a way to provide the optimum growth conditions of AlN and GaN for the MOVPE. [ABSTRACT FROM AUTHOR] |
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| قاعدة البيانات: |
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