Academic Journal
Initial phase formation and dissociation in the thin-film Ni/Al system.
| العنوان: | Initial phase formation and dissociation in the thin-film Ni/Al system. |
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| المؤلفون: | Colgan, E. G., Nastasi, M., Mayer, J. W. |
| المصدر: | Journal of Applied Physics. 12/1/1985, Vol. 58 Issue 11, p4125. 5p. |
| مصطلحات موضوعية: | *THIN films, *NICKEL, *ALUMINUM |
| مستخلص: | Presents a study which investigated initial phase formation and dissociation in the thin-film nickel/aluminum system. Method of the study; Results and discussion; Conclusion. |
| قاعدة البيانات: | Academic Search Index |
| تدمد: | 00218979 |
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| DOI: | 10.1063/1.335542 |