Patent
Resin and photoresist composition comprising the same
| العنوان: | Resin and photoresist composition comprising the same |
|---|---|
| Patent Number: | 9,507,258 |
| تاريخ النشر: | November 29, 2016 |
| Appl. No: | 13/290558 |
| Application Filed: | November 07, 2011 |
| مستخلص: | The present invention provides a resin comprising a structural unit represented by the formula (aa): [chemical expression included] wherein T1 represents a C4-C34 sultone ring group optionally having one or more substituents, X1 represents —O— or —N(Rc)—, Rc represents a hydrogen atom or a C1-C6 alkyl group, Z1 represents *-X2—, *-X2—X4—CO—X3—, or *-X2—CO—X4—X3—, X2 and X3 independently each represent a C1-C6 alkanediyl group, X4 represents —O— or —N(Rc)—, * represents a binding position to X1, and R1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom. |
| Inventors: | Ichikawa, Koji (Osaka, JP); Shimada, Masahiko (Osaka, JP); Nishimura, Takashi (Osaka, JP) |
| Assignees: | SUMITOMO CHEMICAL COMPANY, LIMITED (Tokyo, JP) |
| Claim: | 1. A resin comprising a structural unit represented by the formula (aa): [chemical expression included] wherein T 1 represents a group represented by the formula (T1): [chemical expression included] wherein X 11 , X 12 and X 13 independently each represent —O—, —S— or —CH 2 —, one or two hydrogen atoms in —CH 2 — in the formula (T1) may be replaced by a halogen atom, a hydroxyl group, a cyano group, C1-C12 alkyl group optionally having a halogen atom or a hydroxyl group, a C1-C12 alkoxy group, C6-C12 aryl group, a C7-C12 aralkyl group, a glycidyloxy group, a C2-C12 alkoxycarbonyl group or a C2-C4 acyl group, and * represents a binding position to —O—, in the formula (aa), X 1 represents —O— or —N(R c)—, R c represents a hydrogen atom or a C1-C6 alkyl group, Z 1 represents a C1-C6 alkanediyl group and R 1 represents a C1-C6 alkyl group optionally having one or more halogen atoms, a hydrogen atom or a halogen atom. |
| Claim: | 2. The resin according to claim 1 , wherein the resin is one being insoluble or poorly soluble in an aqueous alkali solution but becoming soluble in an aqueous alkali solution by the action of an acid. |
| Claim: | 3. A photoresist composition comprising the resin according to claim 2 and an acid generator. |
| Claim: | 4. The photoresist composition according to claim 3 , which further comprises a solvent. |
| Claim: | 5. The photoresist composition according to claim 3 , which further comprises a basic compound. |
| Claim: | 6. The photoresist composition according to claim 4 , which further comprises a basic compound. |
| Claim: | 7. A process for producing a photoresist pattern comprising: (1) a step of applying the photoresist composition according to claim 3 , claim 4 , claim 5 or claim 6 on a substrate to form a photoresist composition layer, (2) a step of fainting a photoresist film by drying the photoresist composition layer formed, (3) a step of exposing the photoresist film to radiation, (4) a step of heating the photoresist film after exposing, and (5) a step of developing the photoresist film after heating. |
| Patent References Cited: | 2005/0153233 July 2005 Wu et al. 2006/0234154 October 2006 Nishimura et al. 2007/0100096 May 2007 Harada et al. 2007/0298352 December 2007 Kobayashi et al. 2008/0124656 May 2008 Kobayashi et al. 2009/0068590 March 2009 Dazai et al. 2009/0226842 September 2009 Shimizu et al. 2010/0063232 March 2010 Nagai et al. 2010/0086873 April 2010 Seshimo et al. 2010/0178609 July 2010 Dazai et al. 2010/0323296 December 2010 Ichikawa et al. 2011/0065041 March 2011 Ichikawa et al. 2011/0200936 August 2011 Ichikawa et al. 2011/0250538 October 2011 Li et al. 2011/0318687 December 2011 Saegusa et al. 2012/0028188 February 2012 Ichikawa et al. 2012/0141939 June 2012 Thackeray et al. 2012/0178021 July 2012 Kim et al. 2012/0219904 August 2012 Ichikawa et al. 2012/0258401 October 2012 Ichikawa et al. |
| Other References: | Crivello et al., Journal of Polymer Science, Part A, Polymer Chemistry, vol. 37, 1999, pp. 4241-4254. cited by applicant U.S. Final Rejection dated Sep. 27, 2013 for U.S. Appl. No. 13/290,618. cited by applicant U.S. Office Action dated Apr. 19, 2013 for U.S. Appl. No. 13/290,618. cited by applicant U.S. Office Action dated Jul. 26, 2013 for U.S. Appl. No. 13/443,155. cited by applicant Taiwanese Office Action and Search Report, issued May 13, 2015, for Taiwanese Application No. 100140496, along with English translations. cited by applicant |
| Assistant Examiner: | Cepluch, Alyssa L |
| Primary Examiner: | Kelly, Cynthia H |
| Attorney, Agent or Firm: | Birch, Stewart, Kolasch & Birch, LLP |
| رقم الانضمام: | edspgr.09507258 |
| قاعدة البيانات: | USPTO Patent Grants |
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