Academic Journal
Photodetachment of negative ions in an RF etching plasma
| العنوان: | Photodetachment of negative ions in an RF etching plasma |
|---|---|
| المؤلفون: | Jauberteau, J.L., Meeusen, G.J., Haverlag, M., Kroesen, Gerrit M.W., de Hoog, Frits J. |
| المساهمون: | Dubreuil, B. |
| المصدر: | Jauberteau , J L , Meeusen , G J , Haverlag , M , Kroesen , G M W & de Hoog , F J 1990 , Photodetachment of negative ions in an RF etching plasma . in B Dubreuil (ed.) , ESCAMPIG 90 :10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, Orleans, France, August 28-31, 1990 : Abstracts of Invited Talks and Contributed Papers . Europhysics conference abstracts , vol. 14E , European Physical Society (EPS) , pp. 96-97 , 10th European Sectional Conference on Atomic and Molecular Physics of Ionized Gases, (ESCAMPIG 1990) .... |
| بيانات النشر: | European Physical Society (EPS) |
| سنة النشر: | 1990 |
| نوع الوثيقة: | article in journal/newspaper |
| اللغة: | English |
| Relation: | https://research.tue.nl/en/publications/041fc258-2fe9-4102-98d3-a14fc10d079b |
| الاتاحة: | https://research.tue.nl/en/publications/041fc258-2fe9-4102-98d3-a14fc10d079b |
| Rights: | info:eu-repo/semantics/closedAccess |
| رقم الانضمام: | edsbas.D25B81E0 |
| قاعدة البيانات: | BASE |
| الوصف غير متاح. |