Academic Journal
The Chemical Vapor Deposition of Iridium.
| العنوان: | The Chemical Vapor Deposition of Iridium. |
|---|---|
| المؤلفون: | Mooney,John B, Rewick,Robert T, Haynes,Daniel L, Gray,Thomas E, Vandenberg,David M |
| المساهمون: | SRI INTERNATIONAL MENLO PARK CA |
| المصدر: | DTIC AND NTIS |
| سنة النشر: | 1981 |
| المجموعة: | Defense Technical Information Center: DTIC Technical Reports database |
| مصطلحات موضوعية: | Electrical and Electronic Equipment, Fabrication Metallurgy, THIN FILMS, VAPOR DEPOSITION, CATHODES(ELECTRON TUBES), IRIDIUM, VAPORS, HYDROGEN, SATELLITE COMMUNICATIONS, TRAVELING WAVE TUBES, CARBON MONOXIDE, FLUORIDES, THERMIONIC EMISSION, IRIDIUM COMPOUNDS, Dispenser cathodes, Thermionic cathodes, Chemical vapor deposition, LPN-SRI-1013 |
| الوصف: | The preparation of iridium films for thermionic cathodes by chemical vapor deposition was studied. The deposition from IrCl3/H2/CO atmospheres was very inefficient; however, iridium was deposited from IrF3/H2/CO at 465 C + or - 25 C with reasonable efficiency. The majority of the deposits were porous or loose powders. An attempt to deposit iridium on a substrate designed to produce a microporous film was unsuccessful because of the poor throwing-power of the process. (Author) |
| نوع الوثيقة: | text |
| وصف الملف: | text/html |
| اللغة: | English |
| Relation: | http://www.dtic.mil/docs/citations/ADA104582 |
| الاتاحة: | http://www.dtic.mil/docs/citations/ADA104582 http://oai.dtic.mil/oai/oai?&verb=getRecord&metadataPrefix=html&identifier=ADA104582 |
| Rights: | APPROVED FOR PUBLIC RELEASE |
| رقم الانضمام: | edsbas.8C8FDE6E |
| قاعدة البيانات: | BASE |
| الوصف غير متاح. |