Detection method for a T-topped profile in resist patterns by CD-SEM
| العنوان: | Detection method for a T-topped profile in resist patterns by CD-SEM |
|---|---|
| المؤلفون: | Hiroshi Fukuda, Atsuko Yamaguchi, Shozo Yoneda, Osamu Komuro, Takashi Iizumi |
| المصدر: | Metrology, Inspection, and Process Control for Microlithography XVIII. |
| بيانات النشر: | SPIE, 2004. |
| سنة النشر: | 2004 |
| مصطلحات موضوعية: | Optics, Materials science, Correlation coefficient, Resist, business.industry, law, Surface finish, Edge (geometry), Photolithography, business, law.invention |
| الوصف: | A new method of detecting a T-topped profile in resist patterns is described. This method can determine a T-topped tendency from only a single top-down CD-SEM image. The idea is based on the relationship between the cross-sectional pattern profile and the shape of the bright area near the pattern edge in the top-down image. Two kinds of index for a T-topped tendency are defined using line-edge roughness, width of the bright area, and the correlation coefficient between the left and right borders of the area. Both indices agreed well with actual cross-sectional profiles of various resist patterns. In addition, it is found that these indices can be used to estimate defocus in the photolithography process. |
| تدمد: | 0277-786X |
| DOI: | 10.1117/12.534618 |
| URL الوصول: | https://explore.openaire.eu/search/publication?articleId=doi_________::1eb3e47836a3699f8e0cd42ddf637303 https://doi.org/10.1117/12.534618 |
| رقم الانضمام: | edsair.doi...........1eb3e47836a3699f8e0cd42ddf637303 |
| قاعدة البيانات: | OpenAIRE |
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