التفاصيل البيبلوغرافية
| العنوان: |
A Block on the Old Chip: Block copolymers may help transistors shrink to tinier dimensions. |
| المؤلفون: |
Savage, Neil |
| المصدر: |
Communications of the ACM; Nov2017, Vol. 60 Issue 11, p12-14, 3p, 1 Diagram |
| مصطلحات موضوعية: |
BLOCK copolymers, TRANSISTOR design & construction, MOLECULAR self-assembly, IMMERSION lithography, EXTREME ultraviolet lithography, PHOTOLITHOGRAPHY |
| مستخلص: |
The article discusses the use of block polymers for directed self-assembly (DSA) in transistor manufacturing. Topics include problems with extreme ultraviolet (EUV) photolithography technology research, the development of immersion lithography, and the use of the block copolymer polystyrene and polymethyl methacrylate (PS-PMMA). |
| قاعدة البيانات: |
Complementary Index |