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1
المؤلفون: V. Kvon, van de Mcm Richard Sanden, Thomas Morgan, van Gg Stein Eden
المساهمون: Science and Technology of Nuclear Fusion, Plasma & Materials Processing
المصدر: Nature Communications
Nature Communications, 8(1):192. Nature Publishing Group
Nature Communications, 8, 192
Nature Communications, Vol 8, Iss 1, Pp 1-10 (2017)مصطلحات موضوعية: Liquid metal, Materials science, Science, General Physics and Astronomy, Nanotechnology, 7. Clean energy, 01 natural sciences, Article, General Biochemistry, Genetics and Molecular Biology, 010305 fluids & plasmas, Physics::Plasma Physics, 0103 physical sciences, Nuclear fusion, 010306 general physics, Dynamic equilibrium, Multidisciplinary, Divertor, technology, industry, and agriculture, General Chemistry, Plasma, Mechanics, Fusion power, Electricity generation, 13. Climate action, Electromagnetic shielding
وصف الملف: application/pdf
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2
المؤلفون: Dub Damien Aussems, van de Mcm Richard Sanden, K. Bystrov, van den Ad M Berg, van Gg Stein Eden, Thomas Morgan
المساهمون: Science and Technology of Nuclear Fusion, Plasma & Materials Processing
المصدر: Physical Review Letters, 116(13):135002, 1-5. American Physical Society
Physical Review Letters
Physical Review Letters, 116, 135002مصطلحات موضوعية: Liquid metal, Materials science, General Physics and Astronomy, Plasma, Decoupling (cosmology), Fusion power, 7. Clean energy, 01 natural sciences, Molecular physics, 010305 fluids & plasmas, Heat flux, 13. Climate action, 0103 physical sciences, Electromagnetic shielding, 010306 general physics, Temperature response, Intensity (heat transfer)
وصف الملف: application/pdf
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3
المؤلفون: Wmm Erwin Kessels, Fred Roozeboom, E Erik Langereis, Rfh Roel Roijmans, van de Mcm Richard Sanden
المساهمون: Plasma & Materials Processing, Applied Physics and Science Education, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: Journal of the Electrochemical Society, 158, G34-G38
Journal of the Electrochemical Society, 158(2), G34-G38. Electrochemical Society, Inc.مصطلحات موضوعية: Materials science, Renewable Energy, Sustainability and the Environment, Analytical chemistry, Dielectric, Plasma, Condensed Matter Physics, Microstructure, Electrochemistry, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Amorphous solid, Adduct, Atomic layer deposition, Materials Chemistry, Remote plasma
وصف الملف: application/pdf
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4
المؤلفون: AJ Arjan Flikweert, Stefan Muthmann, G Gijs Dingemans, Aad Gordijn, Matthias Meier, van de Mcm Richard Sanden
المساهمون: Plasma & Materials Processing
المصدر: Solar Energy Materials and Solar Cells, 95(12), 3328-3332. Elsevier
Solar Energy Materials and Solar Cells, 95, 3328-3332مصطلحات موضوعية: Materials science, Silicon, Renewable Energy, Sustainability and the Environment, Nanocrystalline silicon, Analytical chemistry, chemistry.chemical_element, Quantum dot solar cell, Polymer solar cell, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Amorphous solid, Monocrystalline silicon, chemistry, Plasmonic solar cell, sense organs, Thin film
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5
المؤلفون: ME Merijn Donders, Phl Peter Notten, Jfm Jos Oudenhoven, van de Mcm Richard Sanden, Hcm Harm Knoops, Wmm Erwin Kessels, Loïc Baggetto
المصدر: ECS Transactions. 33:213-222
مصطلحات موضوعية: Battery (electricity), Software portability, Stack (abstract data type), Computer science, All solid state, Miniaturization, Thin film, Layer (electronics), Engineering physics, Energy storage
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6
المؤلفون: V Vasco Verlaan, Wmm Erwin Kessels, G Gijs Dingemans, van de Mcm Richard Sanden, van den Lrjg Elzen
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Physica Status Solidi C: Conferences, 7(3-4), 976-979. Wiley-VCH Verlag
مصطلحات موضوعية: Elastic recoil detection, X-ray photoelectron spectroscopy, Annealing (metallurgy), Scattering, Chemistry, Atom, Analytical chemistry, Hydrogen content, Plasma, Fourier transform infrared spectroscopy, Condensed Matter Physics
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7
المؤلفون: PM Paul Gevers, Hcw Herman Beijerinck, Jjh Joost Gielis, van de Mcm Richard Sanden, Wmm Erwin Kessels
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 28(2), 293-301. AVS Science and Technology Society
مصطلحات موضوعية: Amorphous silicon, Range (particle radiation), Materials science, Silicon, Dangling bond, Second-harmonic generation, chemistry.chemical_element, Surfaces and Interfaces, Photon energy, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry.chemical_compound, chemistry, Sputtering, Crystalline silicon, Atomic physics
وصف الملف: application/pdf
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8
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Electrochemical and Solid-State Letters, 13(3), H76-H79. Electrochemical Society, Inc.
مصطلحات موضوعية: Materials science, Passivation, General Chemical Engineering, Analytical chemistry, Nanotechnology, Plasma, Chemical vapor deposition, Deposition temperature, Atomic layer deposition, Plasma-enhanced chemical vapor deposition, Negative charge, Electrochemistry, General Materials Science, Electrical and Electronic Engineering, Physical and Theoretical Chemistry
وصف الملف: application/pdf
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9
المؤلفون: Wmm Erwin Kessels, Ajm Adrie Mackus, van de Mcm Richard Sanden, Hcm Harm Knoops, E Erik Langereis, Sbs Stephan Heil
المساهمون: Plasma & Materials Processing, Selective atomic-scale processing for nanoelectronics, Atomic scale processing
المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 28(1), 77-87. AVS Science and Technology Society
مصطلحات موضوعية: Reaction mechanism, business.industry, Chemistry, Analytical chemistry, Surfaces and Interfaces, Plasma, Condensed Matter Physics, Surfaces, Coatings and Films, Chemical kinetics, Atomic layer deposition, Scientific method, Optoelectronics, Deposition (phase transition), Emission spectrum, Thin film, business
وصف الملف: application/pdf
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10
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Journal of the Electrochemical Society, 157(12), G241-G249. Electrochemical Society, Inc.
مصطلحات موضوعية: 010302 applied physics, Materials science, Renewable Energy, Sustainability and the Environment, Monte Carlo method, 02 engineering and technology, Plasma, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Atomic layer deposition, 13. Climate action, Chemical physics, 0103 physical sciences, Thermal, Trench, Materials Chemistry, Electrochemistry, 0210 nano-technology, Saturation (chemistry), Deposition (chemistry), Recombination
وصف الملف: application/pdf
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11
المؤلفون: Fred Roozeboom, SE Stephen Potts, Simon A. Rushworth, van de Mcm Richard Sanden, A Anitha Sarkar, Wmm Erwin Kessels
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USA, 385-393
STARTPAGE=385;ENDPAGE=393;TITLE=Proceedings of the 218th ECS Meeting, 10-15 October, 2010, Las Vegas, USAمصطلحات موضوعية: Anatase, Materials science, Cyclopentadienyl complex, Inorganic chemistry, Remote plasma, Thin film, Atmospheric temperature range, Stoichiometry, Amorphous solid, Titanium oxide
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12
المؤلفون: Harm C. M. Knoops, Wilhelmus Mathijs Marie Kessels, ME Merijn Donders, van de Mcm Richard Sanden, Phl Peter Notten
المساهمون: Plasma & Materials Processing, Electromechanics and Power Electronics, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: Journal of the Electrochemical Society, 158(4), G92-G96. Electrochemical Society, Inc.
Journal of the Electrochemical Society, 158, G92-G96
Scopus-Elsevierمصطلحات موضوعية: Materials science, Renewable Energy, Sustainability and the Environment, Layer by layer, Analytical chemistry, chemistry.chemical_element, Substrate (electronics), Condensed Matter Physics, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Atomic layer deposition, Carbon film, chemistry, Materials Chemistry, Electrochemistry, Atomic layer epitaxy, Remote plasma, Fourier transform infrared spectroscopy, Thin film, Cobalt, Plasma processing, Cobalt oxide
وصف الملف: application/pdf
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13
المؤلفون: Jjh Joost Gielis, van de Mcm Richard Sanden, van den Pj Peter Oever, Bram Hoex, Wmm Erwin Kessels
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Thin Solid Films, 517(12), 3456-3460. Elsevier
مصطلحات موضوعية: Amorphous silicon, Materials science, Silicon, Passivation, business.industry, Metals and Alloys, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Chemical vapor deposition, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Carbon film, chemistry, Materials Chemistry, Optoelectronics, Crystalline silicon, Thin film, business, Surface states
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14
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Journal of Applied Physics, 104(7):073701, 073701-1/5. American Institute of Physics
مصطلحات موضوعية: Materials science, Passivation, business.industry, Annealing (metallurgy), Analytical chemistry, General Physics and Astronomy, Second-harmonic generation, Electrostatic induction, Atomic layer deposition, Optoelectronics, Surface second harmonic generation, Crystalline silicon, Thin film, business
وصف الملف: application/pdf
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15
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Journal of Vacuum Science and Technology A: Vacuum, Surfaces, and Films, 26(3), 472-480. AVS Science and Technology Society
مصطلحات موضوعية: Detection limit, Materials science, Inorganic chemistry, Tantalum, Analytical chemistry, chemistry.chemical_element, Surfaces and Interfaces, Condensed Matter Physics, Surfaces, Coatings and Films, Elastic recoil detection, Atomic layer deposition, chemistry, X-ray crystallography, Thin film, Deposition (chemistry), Stoichiometry
وصف الملف: application/pdf
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16
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Thin Solid Films, 516(5), 511-516. Elsevier
مصطلحات موضوعية: Materials science, Metals and Alloys, Nucleation, Analytical chemistry, Infrared spectroscopy, Surfaces and Interfaces, Chemical vapor deposition, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Amorphous solid, Ellipsometry, Attenuated total reflection, Materials Chemistry, Surface roughness, Thin film
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17
المؤلفون: Wmm Erwin Kessels, van de Mcm Richard Sanden, Phl Peter Notten, Rah Rogier Niessen, E Erik Langereis, Hcm Harm Knoops, Johan Hendrik Klootwijk, Loïc Baggetto, Fred Roozeboom
المساهمون: Plasma & Materials Processing, Inorganic Materials & Catalysis, Atomic scale processing
المصدر: Journal of the Electrochemical Society, 155(12), G287-G294. Electrochemical Society, Inc.
مصطلحات موضوعية: 010302 applied physics, Materials science, Diffusion barrier, Renewable Energy, Sustainability and the Environment, Diffusion, Analytical chemistry, chemistry.chemical_element, 02 engineering and technology, 021001 nanoscience & nanotechnology, Condensed Matter Physics, Electrochemistry, 01 natural sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Atomic layer deposition, chemistry, Electrical resistivity and conductivity, 0103 physical sciences, Materials Chemistry, Remote plasma, 0210 nano-technology, Tin, Deposition (law)
وصف الملف: application/pdf
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18
المؤلفون: van de Mcm Richard Sanden, Jan Schmidt, Bram Hoex, Agnes Merkle, Wmm Erwin Kessels, Rolf Brendel
المساهمون: Plasma & Materials Processing, Atomic scale processing
المصدر: Progress in Photovoltaics: Research and Applications, 16(6), 461-466. Wiley
مصطلحات موضوعية: Materials science, Silicon, Passivation, Renewable Energy, Sustainability and the Environment, business.industry, Energy conversion efficiency, chemistry.chemical_element, Mineralogy, Condensed Matter Physics, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, chemistry, Aluminium oxide, Optoelectronics, Crystalline silicon, Electrical and Electronic Engineering, Silicon oxide, business, Layer (electronics), Common emitter
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19
المؤلفون: Srinath Ponduri, Markus M. Becker, S Stefan Welzel, Rah Richard Engeln, Detlef Loffhagen, van de Mcm Richard Sanden
المساهمون: Plasma & Materials Processing, Plasma-based gas conversion
المصدر: Journal of Applied Physics, 119, 093301
Journal of Applied Physics, 119(9):093301. American Institute of Physicsمصطلحات موضوعية: 010302 applied physics, Chemistry, General Physics and Astronomy, Dielectric barrier discharge, Dielectric, Plasma, 01 natural sciences, Dissociation (chemistry), 010305 fluids & plasmas, 0103 physical sciences, Electrode, Specific energy, Atomic physics, Electron ionization, Voltage
وصف الملف: application/pdf
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20
المؤلفون: Matthieu Weber, Noemi Leick, JW Jan-Willem Weber, Ajm Adrie Mackus, van de Mcm Richard Sanden, Wmm Erwin Kessels
المساهمون: Plasma & Materials Processing, Selective atomic-scale processing for nanoelectronics, Atomic scale processing, Processing of low-dimensional nanomaterials
المصدر: Journal of Physics D: Applied Physics, 49(12):115504. Institute of Physics
Journal of Physics D: Applied Physics, 49, 115504مصطلحات موضوعية: 010302 applied physics, In situ, Range (particle radiation), Materials science, Acoustics and Ultrasonics, Period (periodic table), Analytical chemistry, Nucleation, 02 engineering and technology, Photon energy, 021001 nanoscience & nanotechnology, Condensed Matter Physics, 01 natural sciences, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, Metal, Atomic layer deposition, Electrical resistivity and conductivity, visual_art, 0103 physical sciences, visual_art.visual_art_medium, 0210 nano-technology
وصف الملف: application/pdf