المؤلفون: van Haren, Richard J. F., Li, Suwen, Baars, Mart, Minghetti, Blandine, van Dijk, Leon, Mendes, Ivanie, Abadie, Karine, Pourteau, Marie-Line, Mauguen, Gaelle, May, Michael, Balan, Viorel, Fournel, Frank, Pain, Laurent, Plach, Thomas, Probst, Gernot, Wimplinger, Markus

المساهمون: Liddle, J. Alexander, Ruiz, Ricardo

المصدر: Novel Patterning Technologies 2024

الاتاحة: http://dx.doi.org/10.1117/12.3010477

المؤلفون: van Haren, Richard J. F., Li, Suwen, Minghetti, Blandine, van Dijk, Leon, Brantjes, Klaas, Fournel, Frank, Mauguen, Gaelle, Mendes, Ivanie, Lapeyre, Celine, Pourteau, Marie-Line, May, Michael, Pain, Laurent, Abadie, Karine, Plach, Thomas, Wimplinger, Markus

المساهمون: Robinson, John C., Sendelbach, Matthew J.

المصدر: Metrology, Inspection, and Process Control XXXVII

الاتاحة: http://dx.doi.org/10.1117/12.2657422

المؤلفون: van Haren, Richard J. F., Steinert, Steffen, Mouraille, Orion, Yildirim, Oktay, Hermans, Jan, van Dijk, Leon, Beyer, Dirk

المساهمون: Liang, Ted, Kim, Seong-Sue

المصدر: Photomask Technology 2023

الاتاحة: http://dx.doi.org/10.1117/12.2687307

المؤلفون: Balan, Viorel, Michel, Florent, Mendes, Ivanie, Lapeyre, Celine, Vignoud, Lionel, Otten, Ronald, Mouraille, Orion, van Dijk, Leon, Minghetti, Blandine, Depre, Jerome, van Haren, Richard J. F.

المساهمون: Robinson, John C., Sendelbach, Matthew J.

المصدر: Metrology, Inspection, and Process Control XXXVII

الاتاحة: http://dx.doi.org/10.1117/12.2658296

المؤلفون: van Haren, Richard J. F., Steinert, Steffen, Mouraille, Orion, Kasperkiewicz, Ewa, Hermans, Jan, Hasan, Mahmudul, van Dijk, Leon, Beyer, Dirk

المساهمون: Kasprowicz, Bryan S., Liang, Ted

المصدر: Photomask Technology 2022

الاتاحة: http://dx.doi.org/10.1117/12.2641618

المؤلفون: van Haren, Richard J. F., Yildirim, Oktay, Mouraille, Orion, van Dijk, Leon, Kumar, Kaushik, Feurprier, Yannick, Jehoul, Christiane, Hermans, Jan

المساهمون: Bannister, Julie, Mohanty, Nihar

المصدر: Advanced Etch Technology and Process Integration for Nanopatterning XI

الاتاحة: http://dx.doi.org/10.1117/12.2614255

المؤلفون: van Haren, Richard J. F., Otten, Ronald, Singh, Subodh, Singh, Amandev, van Dijk, Leon, Owen, David, Anberg, Doug, Mileham, Jeffrey, Gu, Yajun, Hermans, Jan

المساهمون: Adan, Ofer, Ukraintsev, Vladimir A.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII

الاتاحة: http://dx.doi.org/10.1117/12.2515391

المؤلفون: van Haren, Richard J. F., Steinert, Steffen, Mouraille, Orion, D’havé, Koen, van Dijk, Leon, Hermans, Jan, Beyer, Dirk

المساهمون: Rankin, Jed H., Preil, Moshe E.

المصدر: Photomask Technology 2019

الاتاحة: http://dx.doi.org/10.1117/12.2536270

المؤلفون: van Dijk, Leon, Hasibi, Faegheh, Larrañaga, Maialen, Pastol, Anne, Lam, Auguste, van Haren, Richard J. F.

المساهمون: Adan, Ofer, Ukraintsev, Vladimir A.

المصدر: Metrology, Inspection, and Process Control for Microlithography XXXIII

الاتاحة: http://dx.doi.org/10.1117/12.2515185

المؤلفون: van Haren, Richard J. F.

المساهمون: Rankin, Jed H., Gallagher, Emily E.

المصدر: Photomask Technology 2018

الاتاحة: http://dx.doi.org/10.1117/12.2502917

المؤلفون: van Haren, Richard J. F., Hermans, Jan, Kumar, Kaushik, Yamashita, Fumiko, Calado, Victor, van Dijk, Leon

المساهمون: Engelmann, Sebastian U., Wise, Richard S.

المصدر: Advanced Etch Technology for Nanopatterning VII

الاتاحة: http://dx.doi.org/10.1117/12.2303521

المؤلفون: Huijbregste, Jeroen, van Haren, Richard J. F., Jeunink, Andre, Hinnen, Paul C., Swinnen, Bart, Navarro, Ramon, Simons, Geert, van Bilsen, Frank, Tolsma, Hoite, Megens, Henry J. L.

المساهمون: Herr, Daniel J.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XVII ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.482814
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.482814

المؤلفون: Laidler, David W., Megens, Henry J. L., Lalbahadoersing, Sanjay, van Haren, Richard J. F., Bornebroek, Frank

المساهمون: Herr, Daniel J. C.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XVI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.473478
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.473478

المؤلفون: Staecker, Jens, Arendt, Stefanie, Schumacher, Karl, Mos, Evert C., van Haren, Richard J. F., van der Schaar, Maurits, Edart, Remi, Demmerle, Wolfgang, Tolsma, Hoite

المساهمون: Herr, Daniel J. C.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XVI ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.473421

المؤلفون: Hinnen, Paul C., Megens, Henry J. L., van der Schaar, Maurits, van Haren, Richard J. F., Mos, Evert C., Lalbahadoersing, Sanjay, Bornebroek, Frank, Laidler, David W.

المساهمون: Sullivan, Neal T.

المصدر: SPIE Proceedings ; Metrology, Inspection, and Process Control for Microlithography XV ; ISSN 0277-786X

الاتاحة: http://dx.doi.org/10.1117/12.436734
http://proceedings.spiedigitallibrary.org/proceeding.aspx?doi=10.1117/12.436734

المؤلفون: Warrick, Scott P., Hinnen, Paul C., van Haren, Richard J. F., Smith, Chris J., Megens, Henry J. L., Fu, Chong-Cheng

المصدر: Proceedings of SPIE; Nov2002, Issue 1, p971-980, 10p

المؤلفون: Cain, Jason P., Sanchez, Martha I., Smilde, Henk-Jan H., van Haren, Richard J. F., van Buël, Willy, Driessen, Lars H. D., Dépré, Jérôme, Beltman, Jan, Dettoni, Florent, Ducoté, Julien, Dezauzier, Christophe, Blancquaert, Yoann

المصدر: Proceedings of SPIE; March 2015, Vol. 9424 Issue: 1 p942412-942412-10