المؤلفون: Panabière, J.P., Francou, J.M., Weill, Agnès, Guérin, L., Moschini, P., Inard, A., Amblard, G., Lalanne, F.

المصدر: ISSN: 0035-1687.

مصطلحات موضوعية: integrated circuit technology, masks, photoresists, processing, buried photomasks, absorbent patterns, transparent photoplate, etching, glass substrate, planarisation, lift off, vacuum contact printing, novolak based photoresists, [PHYS.HIST]Physics [physics]/Physics archives

Relation: jpa-00246247; https://hal.archives-ouvertes.fr/jpa-00246247; https://hal.archives-ouvertes.fr/jpa-00246247/document; https://hal.archives-ouvertes.fr/jpa-00246247/file/ajp-rphysap_1990_25_8_859_0.pdf

الاتاحة: https://hal.archives-ouvertes.fr/jpa-00246247
https://hal.archives-ouvertes.fr/jpa-00246247/document
https://hal.archives-ouvertes.fr/jpa-00246247/file/ajp-rphysap_1990_25_8_859_0.pdf
https://doi.org/10.1051/rphysap:01990002508085900

المؤلفون: P. Moschini, F. Lalanne, Gilles R. Amblard, Jean-Pierre Panabiere, Alain Inard, Jean-Marc Francou, L. Guérin, André Weill

المصدر: Revue de Physique Appliquée
Revue de Physique Appliquée, Société française de physique / EDP, 1990, 25 (8), pp.859-865. ⟨10.1051/rphysap:01990002508085900⟩

مصطلحات موضوعية: Plasma etching, Fabrication, Materials science, masks, novolak based photoresists, Nanotechnology, Mascara, transparent photoplate, planarisation, law.invention, glass substrate, law, Etching (microfabrication), [PHYS.HIST]Physics [physics]/Physics archives, integrated circuit technology, photoresists, buried photomasks, etching, processing, Photolithography, Photomask, lift off, vacuum contact printing, absorbent patterns, Electron-beam lithography

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::12481709339b2dae8f659185770c30f6
https://hal.archives-ouvertes.fr/jpa-00246247