يعرض 1 - 4 نتائج من 4 نتيجة بحث عن '"titanium nitride layer"', وقت الاستعلام: 0.32s تنقيح النتائج
  1. 1
    Academic Journal
    Comparative Study of Physicochemical Properties and Biocompatibility (L929 and MG63 Cells) of TiN Coatings Obtained by Plasma Nitriding and Thin Film Deposition

    المؤلفون: Cristian Padilha Fontoura (11171739), Patrícia Ló Bertele (11171742), Melissa Machado Rodrigues (11171745), Ana Elisa Dotta Maddalozzo (11171748), Rafaele Frassini (11171751), Charlene Silvestrin Celi Garcia (11171754), Sandro Tomaz Martins (11171757), Janaina da Silva Crespo (7823561), Carlos A. Figueroa (6651596), Mariana Roesch-Ely (6380366), Cesar Aguzzoli (4986020)

    مصطلحات موضوعية: Biophysics, Medicine, Cell Biology, Biotechnology, Immunology, Developmental Biology, Cancer, Hematology, Environmental Sciences not elsewhere classified, Biological Sciences not elsewhere classified, Physical Sciences not elsewhere classified, grade Ti 6Al, TiN Coatings Obtained, L 929 fibroblasts, physicochemical characterization te., plasma nitrided surfaces, surface modification, titanium nitride layer, MG 63 Cells, titanium nitride phases, cell lines, Thin Film Deposition Ti 6Al, film deposition

    Relation: https://figshare.com/articles/journal_contribution/Comparative_Study_of_Physicochemical_Properties_and_Biocompatibility_L929_and_MG63_Cells_of_TiN_Coatings_Obtained_by_Plasma_Nitriding_and_Thin_Film_Deposition/15035946

    الاتاحة: https://doi.org/10.1021/acsbiomaterials.1c00393.s001

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  2. 2
    Dissertation/ Thesis
    Příprava a vyhodnocení nitridové vrstvy na povrchu titanu pomocí metody PACVD. ; Preparation and evaluation of the nitride layer on the titanium surface using the PACVD method.

    المؤلفون: Jan Dáňa

    المساهمون: Tolde Zdeněk, Krčil Jan

    مصطلحات موضوعية: PACVD, povrchová úprava, titan, vrstva nitridu titanu, surface finish, titanium, titanium nitride layer

    وصف الملف: application/pdf

    Relation: KOS-1082974745805; http://hdl.handle.net/10467/103554

    الاتاحة: http://hdl.handle.net/10467/103554

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  3. 3
    Patent
    Method of fabricating contact plug

    المؤلفون: Peng, Yuan Ching, Chen, Lih Juann, Yang, Yu Ru, Hsieh, Win Yi, Hsieh, Yong Fen

    المساهمون: 陳力俊

    مصطلحات موضوعية: metal plug, MOS, dielectric layer, nitrogen environment, titanium layer, titanium nitride layer

    Time: 3

    Relation: 專利權人：United Microelectronics Corp.; US6043148; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/58483

    الاتاحة: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/58483

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  4. 4
    Patent
    Method of manufacturing semiconductor components having a titanium nitride layer

    المؤلفون: Peng, Yuan Ching, Chen, Lih Juann, Hsieh, Wen Yi, Lin, Jenn Tarng, Hsieh, Yong Fen

    المساهمون: 陳力俊

    مصطلحات موضوعية: semiconductor, titanium nitride layer

    Time: 3

    Relation: 專利權人：United Microelectronics Corp.; US5897373; http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/58478

    الاتاحة: http://nthur.lib.nthu.edu.tw/dspace/handle/987654321/58478

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