المؤلفون: Yiwei Duo, Qichao Yang, Lulu Wang, Yijian Song, Ziqiang Huo, Junxue Ran, Jiankun Yang, Junxi Wang, Tongbo Wei

مصطلحات موضوعية: Biophysics, Biochemistry, Genetics, Biotechnology, Environmental Sciences not elsewhere classified, Biological Sciences not elsewhere classified, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, Information Systems not elsewhere classified, weak interfacial force, flow modulation epitaxy, constructing flexible devices, flexible nitride devices, alleviating lattice mismatch, ordered layered sp, level exfoliation uniform, c impurity concentration, 5 nm sp, level thick sp, level sp, thick sp, uniform wrinkles, nitride semiconductors, lattice spacing, 34 nm, unintentional nitridation, surface morphology, square roughness, sapphire substrate, raman spectrum

Relation: https://figshare.com/articles/journal_contribution/Flow_Modulation_Epitaxy_of_Thick_Boron_Nitride_Epilayers_and_Wafer-Level_Exfoliation/24936000

الاتاحة: https://doi.org/10.1021/acs.cgd.3c01309.s001
https://figshare.com/articles/journal_contribution/Flow_Modulation_Epitaxy_of_Thick_Boron_Nitride_Epilayers_and_Wafer-Level_Exfoliation/24936000