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المؤلفون: Moskvin P.P., Rudnitskyi V.A.
المصدر: Vìsnik Žitomirsʹkogo Deržavnogo Tehnologìčnogo Unìversitetu: Tehnìčnì Nauki, Vol 1, Iss 83, Pp 228-235 (2019)
مصطلحات موضوعية: Shock wave, lcsh:Computer engineering. Computer hardware, Materials science, business.industry, which provided the process of mass transfer of matter from source to substrate during the synthesis of ultrathin oxide semiconductor layers, which allows conducting the synthesis of semiconductor ultrathin films. The equipment was modernized taking into account the features of the thermodynamic properties of semiconductor materials. The data on the main adapted elements of the equipment are given, Detonation, their functional purpose is indicated. Special attention is paid to the principles of operation of both the modified units of equipment and their functional interrelations in managing the process of the synthesis of layers. The conditions for the functioning and burning of gaseous hydrogen - oxygen mixture to obtain a high-energy shock wave, lcsh:TK7885-7895, Multifractal system, Substrate (electronics), synthesis of A2B6 semiconductors nanolayers, Spectral line, Condensed Matter::Materials Science, Semiconductor, lcsh:TA1-2040, multifractal analysis, Mass transfer, Scientific method, surface morphology, Optoelectronics, lcsh:Engineering (General). Civil engineering (General), business, detonation spray method
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المصدر: The Journal of Zhytomyr State Technological University. Series: Engineering; № 1(83) (2019); 228-235
Вісник Житомирського державного технологічного університету. Серія: Технічні науки; № 1(83) (2019): Вісник Житомирського державного технологічного університету. Серія: Технічні науки; 228-235مصطلحات موضوعية: synthesis of A2B6 semiconductors nanolayers, detonation spray method, surface morphology, multifractal analysis, Condensed Matter::Materials Science, синтез наноплівок напівпровідників A2B6, метод детонаційного напилення, морфологія поверхні, мультифрактальний аналіз
وصف الملف: application/pdf