المؤلفون: Rudy Wojtecki (5905430), Jonathan Ma (10018121), Isvar Cordova (9542232), Noel Arellano (2000344), Krystelle Lionti (4517767), Teddie Magbitang (2723701), Thomas G. Pattison (10018124), Xiao Zhao (220944), Eugene Delenia (10018127), Nicholas Lanzillo (8596038), Alexander E. Hess (8596035), Noah Fine Nathel (10018130), Holt Bui (2068501), Charles Rettner (1657996), Gregory Wallraff (2712928), Patrick Naulleau (10018133)

مصطلحات موضوعية: Biophysics, Biochemistry, Cell Biology, Molecular Biology, Biotechnology, Developmental Biology, Computational Biology, Environmental Sciences not elsewhere classified, Biological Sciences not elsewhere classified, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, Information Systems not elsewhere classified, area-selective deposition, SAM, combination, pattern-wise exposure, 50 nm, additive lithography platform, ASD approaches, structure spectroscopy, deposition inhibition, deposition step, silicon spacers, line space patterns, electron beam irradiation, imaging mechanism, bottoms-up additive approach, Near-edge X-ray absorption, dose sensitivity, metal portions

Relation: https://figshare.com/articles/journal_contribution/Additive_Lithography_Organic_Monolayer_Patterning_Coupled_with_an_Area-Selective_Deposition/13623911

الاتاحة: https://doi.org/10.1021/acsami.0c16817.s001