المؤلفون: Lawal Adewale Ogunfowora, Ishwar Singh, Noel Arellano, Thomas G. Pattison, Teddie Magbitang, Khanh Nguyen, Brandi Ransom, Krystelle Lionti, Son Nguyen, Teya Topura, Eugene Delenia, Mark Sherwood, Brett M. Savoie, Rudy Wojtecki

مصطلحات موضوعية: Biochemistry, Molecular Biology, Evolutionary Biology, Developmental Biology, Cancer, Space Science, Chemical Sciences not elsewhere classified, limiting precursor diffusion, increasing thermal stability, nontraditional device architectures, smis provided insight, smis ) propargyl, direct film growth, chemical vapor deposition, critical threshold dimension, reactive vapor, device fabrication, critical dimensions, chemical contrast, tripropargylamine , take advantage, significant contrast, selectively grown, selective inhibitors, selective depositions, residual amounts, reactive moieties, phase inhibitors, network branchpoints, may extend

Relation: https://figshare.com/articles/journal_contribution/Reactive_Vapor-Phase_Inhibitors_for_Area-Selective_Depositions_at_Tunable_Critical_Dimensions/24982695

الاتاحة: https://doi.org/10.1021/acsami.3c14821.s001
https://figshare.com/articles/journal_contribution/Reactive_Vapor-Phase_Inhibitors_for_Area-Selective_Depositions_at_Tunable_Critical_Dimensions/24982695