المؤلفون: Mameli, A., Verheijen, M. A., Mackus, A. J.M., Kessels, W. M.M., Roozeboom, F.

المصدر: Mameli , A , Verheijen , M A , Mackus , A J M , Kessels , W M M & Roozeboom , F 2018 , ' Isotropic atomic layer etching of ZnO using Acetylacetone and O2 plasma ' , ACS Applied Materials & Interfaces , vol. 10 , no. 44 , pp. 38588-38595 . https://doi.org/10.1021/acsami.8b12767

مصطلحات موضوعية: atomic layer etching, isotropic removal, nanowires, plasma etching, ZnO

وصف الملف: application/pdf

الاتاحة: https://research.tue.nl/en/publications/95d8f0b4-fc24-4928-96bf-66eaf2845c83
https://doi.org/10.1021/acsami.8b12767
https://pure.tue.nl/ws/files/111115846/acsami.8b12767_1_.pdf
http://www.scopus.com/inward/record.url?scp=85056228229&partnerID=8YFLogxK

المؤلفون: Mameli, A., Verheijen, M.A., Mackus, A.J.M., Kessels, W.M.M., Roozeboom, F.

المصدر: ACS Applied Materials & Interfaces, 38588−38595

مصطلحات موضوعية: Chemistry Physics Materials, Atomic layer etching, Plasma etching, Isotropic removal, ZnO, Nanowires, Industrial Innovation

Relation: uuid:fbce710a-9023-484a-bc31-78b223fecc0f; 843212; http://resolver.tudelft.nl/uuid:fbce710a-9023-484a-bc31-78b223fecc0f

الاتاحة: http://resolver.tudelft.nl/uuid:fbce710a-9023-484a-bc31-78b223fecc0f

مصطلحات موضوعية: Chemistry Physics Materials, Plasma etching, Industrial Innovation, Nanowires, Atomic layer etching, Isotropic removal, ZnO

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::11e652975ce0d099f9344d6665fa7b95
http://resolver.tudelft.nl/uuid:fbce710a-9023-484a-bc31-78b223fecc0f

مصطلحات موضوعية: Atoms, Spectroscopic ellipsometry, atomic layer etching, Alumina, Isotropic materials, Isotropic removal, plasma etching, High resolution transmission electron microscopy, Aluminum oxide, Three-dimensional substrates, Acetone, Magnetic semiconductors, Spectroscopic ellipsometry measurements, Zinc oxide, Infrared spectroscopy, Situ infrared spectroscopy, Carbonaceous species, Substrates, Nanowires, Atomic layer deposition, II-VI semiconductors, Silica, Semiconductor nanowire, Wide band gap semiconductors, Hafnium oxides, ZnO, Transmission electron microscopy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___00893::db25351d752ee35a68c215a1f2a51a3b
http://resolver.tudelft.nl/uuid:d740d100-bc5d-4fa9-8882-dd742eb89bc3

المؤلفون: Mameli, A., Verheijen, M.A., Mackus, A.J.M., Kessels, W.M.M., Roozeboom, F.

مصطلحات موضوعية: Atomic layer etching, ALE, ZnO, Atomic layer deposition, ALD, Plasma etching, Zinc oxide, Isotropic materials, Isotropic removal, Nanowires, Infrared spectroscopy, Industrial Innovation

Relation: uuid:2a36c73e-6dcc-44bf-9fdf-93ef96675824; 862231; http://resolver.tudelft.nl/uuid:2a36c73e-6dcc-44bf-9fdf-93ef96675824

الاتاحة: http://resolver.tudelft.nl/uuid:2a36c73e-6dcc-44bf-9fdf-93ef96675824