المؤلفون: Ida, K., Yoshinuma, M., Kobayashi, M., Kobayashi, T., Kenmochi, N., Nespoli, F., Magee, R. M., Warmer, F., Dinklage, A., Matsuyama, A., Sakamoto, R., Nasu, T., Tokuzawa, T., Kinoshita, T., Tanaka, K., Tamura, N., Nagaoka, K., Nishiura, M., Takemura, Y., Ogawa, K., Motojima, G., Oishi, T., Morishita, Y., Varela, J., Hayashi, W. H. J., Markl, M., Bouvain, H., Liang, Y., Leconte, M., Moseev, D., Moiseenko, Vladimir E., Albert, C. G., Allfrey, I., Alonso, A., Arellano, F. J., Ashikawa, N., Azegami, A., Bardoczi, L., Van Berkel, M., Beurskens, M., Binderbaue, M. W., Bortolon, A., Brezinsek, S., Bussiahn, R., Cappa, A., Carralero, D., Chan, I. C., Cheng, J., Dai, X., Den Hartog, D. J., Dhard, C. P., Ding, F., Ejiri, A., Ertmer, S., Fornal, T., Fujita, K., Fujiwara, Y., Funaba, H., Garcia, L., Garcia-Regana, J. M., Garcia-Cortes, I., Garkusha, I. E., Gates, D. A., Ghai, Y., Gilson, E. P., Gota, H., Goto, M., Green, E. M., Haak, V., Hamaguchi, S., Hanada, K., Hara, H., Hartmann, D., Hayashi, Y., Henning, T., Hidalgo, C., Hillairet, J., Hutton, R., Ido, T., Igami, H., Ikeda, K., Inagaki, S., Ishizawa, A., Ito, S., Isobe, M., Isobe, Y., Ivkovic, M., Jiang, Z., Jo, J., Kamio, S., Kasahara, H., Kato, D., Katoh, Y., Kawachi, Y., Kawamoto, Y., Kawamura, G., Kawate, T., Kazakov, Ye. O., Klumper, V., Knieps, A., Ko, W. H., Kobayashi, S., Koike, F., Kovtun, Yu. V., Kubkowska, M., Kubo, S., Lam, S. S. H., Langenberg, A., Laqua, H., Lazerson, S., Lestz, J., Li, B., Liao, L., Lin, Z., Lunsford, R., Masuzaki, S., Matsuura, H., McCarthy, K. J., Medina-Roque, D., Mitarai, O., Mollen, A., Moon, C., Mori, Y., Morisaki, T., Morita, S., Mukai, K., Murakami, I., Murakami, S., Murase, T., Muscatello, C. M., Nagasaki, K., Naujoks, D., Nakano, H., Nakata, M., Narushima, Y., Nagy, A., Nicolau, J. H., Nishizawa, T., Nishimoto, S., Nuga, H., Nunami, M., Ochoukov, R., Ohdachi, S., Ongena, J., Osakabe, M., Pablant, N. A., Panadero, N., Peterson, B., de la Riva Villen, J., Romazanov, J., Rosato, J., Rud, M., Sakakibara, S., Sakaue, H. A., Sakai, H., Sakon, I., Salewski, M., Sangaroon, S., Sereda, S., Stange, T., Saito, K., Satake, S., Seki, R., Seki, T., Sharapov, S., Shimizu, A., Shimozuma, T., Shivam, G., Shoji, M., Spong, D. A., Sugama, H., Sun, Z., Suzuki, C., Suzuki, Y., Tajima, T., Takada, E., Takahashi, H., Toi, K., Tsuchibushi, Y., Tsujii, N., Tsumori, K., Tsujimurai, T. I., Ueno, G., Uehara, H., Velasco, J. L., Wang, E., Watanabe, K. Y., Wauter, T., Wenzel, U., Yajima, M., Yamada, H., Yamada, I., Yanagihara, K., Yamaguchi, H., Yanai, R., Yasuhara, R., Yokoyama, M., Yoshimura, Y., Zarnstorff, M., Zhao, M., Zhong, G. Q., Zhou, Q., Ziaei, S.

المصدر: Nuclear Fusion. 64(11)

مصطلحات موضوعية: Large Helical Device, basic plasma physics, burning plasma, wave-particle interaction, ion mixing, turbulence spreading

وصف الملف: electronic

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:uu:diva-541326
https://doi.org/10.1088/1741-4326/ad3a7a
https://uu.diva-portal.org/smash/get/diva2:1909023/FULLTEXT01.pdf

المؤلفون: Fan-qi Meng, Wen-shuai Zhang, En-hao Zhang, Qing-kang Liu, Xu Zhang, Ming-jun Chen, Zi-han Lin, Hong-bo Cai, Shao-ping Zhu

المصدر: New Journal of Physics, Vol 26, Iss 6, p 063039 (2024)

مصطلحات موضوعية: shock wave, nonuniform plasmas, ion kinetic effects, ion mixing, Science, Physics, QC1-999

Relation: https://doi.org/10.1088/1367-2630/ad5a33; https://doaj.org/toc/1367-2630; https://doaj.org/article/1a7c535b4a8446b0853fce1c42c88ac6

الاتاحة: https://doi.org/10.1088/1367-2630/ad5a33
https://doaj.org/article/1a7c535b4a8446b0853fce1c42c88ac6

المؤلفون: Hongbo Cai, Wenshuai Zhang, Fengjun Ge, Bao Du, Zhensheng Dai, Shiyang Zou, Shaoping Zhu

المصدر: Frontiers in Physics, Vol 11 (2023)

مصطلحات موضوعية: hybrid fluid-PIC, ion mixing, indirect-drive implosion, hydrodynamic instability, inertial confinement fusion (ICF), Physics, QC1-999

وصف الملف: electronic resource

Relation: https://www.frontiersin.org/articles/10.3389/fphy.2023.1140383/full; https://doaj.org/toc/2296-424X

URL الوصول: https://doaj.org/article/bc2e7b5299c446608f7406d686743cd6

المؤلفون: Pinault-Thaury, M. A., Jomard, F., Mer-Calfati, Christine, Tranchant, Nicolas, Pomorski, Michal, Bergonzo, Philippe, Arnault, Jean-Charles

المساهمون: Groupe d'Etude de la Matière Condensée (GEMAC), Université de Versailles Saint-Quentin-en-Yvelines (UVSQ)-Centre National de la Recherche Scientifique (CNRS), Laboratoire Capteurs Diamant (CEA, LIST) (LCD (CEA, LIST)), Département Métrologie Instrumentation & Information (CEA, LIST) (DM2I (CEA, LIST)), Laboratoire d'Intégration des Systèmes et des Technologies (LIST (CEA)), Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Direction de Recherche Technologique (CEA) (DRT (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay-Laboratoire d'Intégration des Systèmes et des Technologies (LIST (CEA)), Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Commissariat à l'énergie atomique et aux énergies alternatives (CEA)-Université Paris-Saclay, ANR-08-BLAN-0195,DeltaDiam,Manufacture and study of ultra-thin films of highly boron-doped single crystal diamond(2008)

المصدر: ISSN: 0169-4332.

مصطلحات موضوعية: boron doped diamond, Boron-doped delta-layer, Ion mixing, Depth profiling, Backside, Both sides SIMS analysis, Diamond, ELECTRONIC APPLICATIONS, DEPTH PROFILES, INTERFACES, LOW-ENERGY, very thin diamond layer, thin layer, SIMS analysis, photonics, spintronics, [PHYS.COND.CM-MS]Physics [physics]/Condensed Matter [cond-mat]/Materials Science [cond-mat.mtrl-sci], [SPI.OPTI]Engineering Sciences [physics]/Optics / Photonic, [PHYS.PHYS.PHYS-ATM-PH]Physics [physics]/Physics [physics]/Atomic and Molecular Clusters [physics.atm-clus], [PHYS.PHYS.PHYS-ATOM-PH]Physics [physics]/Physics [physics]/Atomic Physics [physics.atom-ph], [SPI.NANO]Engineering Sciences [physics]/Micro and nanotechnologies/Microelectronics

الاتاحة: https://cea.hal.science/cea-01803833
https://cea.hal.science/cea-01803833v1/document
https://cea.hal.science/cea-01803833v1/file/DIAM16_Front%20and%20back%20side%20SIMS%20analysis%20of%20boron%20doped%20delta%20layer%20in%20diamond_submitted%20manuscript.pdf
https://doi.org/10.1016/j.apsusc.2017.03.118

المؤلفون: Röntzsch, Lars

المصدر: Wissenschaftlich-Technische Berichte / Forschungszentrum Rossendorf; FZR-392 Oktober 2003

مصطلحات موضوعية: ion-mixing, self-organization, phase separation, Si nanocluster, non-volatile memory, Si-SiO2 interface, Ge decoration

Relation: urn:nbn:de:bsz:d120-qucosa-237209; qucosa:22351

الاتاحة: https://hzdr.qucosa.de/id/qucosa%3A21727
https://hzdr.qucosa.de/api/qucosa%3A21727/attachment/ATT-0/

المؤلفون: Kunihiko TAGOMORI, Masamichi MATSUURA, Nakaya CHIDA, Tooru SUMIYA, Toshiju KUNIBE, Yuzo SAKURADA, 千田 中哉, 国部 利寿, 松浦 正道, 桜田 勇蔵, 田籠 邦彦, 角谷 透

المصدر: 金属表面技術 / Journal of the Metal Finishing Society of Japan. 1988, 39(10):623

المؤلفون: Wolfhard Möller, Hans-Jürgen Engelmann, Johannes von Borany, Daniel Wolf, Thomas Prüfer, Xiaomo Xu, Karl-Heinz Heinig

المصدر: Journal of Applied Physics

مصطلحات موضوعية: 010302 applied physics, Materials science, Ion mixing, Monte Carlo method, General Physics and Astronomy, 02 engineering and technology, 021001 nanoscience & nanotechnology, 01 natural sciences, Molecular physics, Nanoclusters, Condensed Matter::Materials Science, Lattice (order), 0103 physical sciences, Thermal, Kinetic Monte Carlo, 0210 nano-technology, Silicon oxide, Single layer

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::c9c8d716b920989e63ffe9de6c9cce09

المؤلفون: Ichiro TAKANO

المصدر: Journal of The Surface Finishing Society of Japan. 2001, 52(1):80

المؤلفون: Dai IWASAKI, Hitoshi UCHIDA, Masato YAMASHITA, Satoshi HANAKI, 内田 仁, 山下 正人, 岩崎 大, 花木 聡

المصدر: The Proceedings of Conference of Kansai Branch. 2004, 13

المؤلفون: Hitoshi Ota, Masami Masuda, 太田 斎, 桝田 正美

المصدر: The Proceedings of The Manufacturing & Machine Tool Conference. 2000, :235

المؤلفون: Hiroyuki KONISHI, Hitoshi UCHIDA, Jun'ichiro MIZUKI, Masato YAMASHITA, Masatomo SAKAGUCHI, Satoshi HANAKI, 内田 仁, 小西 啓之, 山下 正人, 水木 純一郎, 花木 聡, 阪口 誠知

المصدر: The proceedings of the JSME annual meeting. 2008, :227

المؤلفون: Masaya IWAKI, 岩木 正哉

المصدر: 精密工学会誌 / Journal of the Japan Society for Precision Engineering. 2004, 70(12):1465

المؤلفون: Yasuo SUZUKI, 鈴木 泰雄

المصدر: 精密工学会誌 / Journal of the Japan Society for Precision Engineering. 2000, 66(4):523

المؤلفون: Masaki Ohkawa, Seiichi Watanabe, Shinji Nagata, Shougo Sawada, Somei Ohnuki, Takanori Suda

المصدر: MATERIALS TRANSACTIONS. 2002, 43(11):2703

المؤلفون: Hitoshi UCHIDA, Masato YAMASHITA, Satoshi HANAKI, Takeaki UETA, 内田 仁, 山下 正人, 植田 壮映, 花木 聡

المصدر: 材料 / Journal of the Society of Materials Science, Japan. 2005, 54(10):982

المؤلفون: Hitoshi UCHIDA, Kazumasa TOKUDA, Masato YAMASHITA, 内田 仁, 山下 正人, 徳田 和将

المصدر: 材料 / Journal of the Society of Materials Science, Japan. 2002, 51(1):107

المؤلفون: Hiroyuki KAGAWA, Hitoshi UCHIDA, Masato YAMASHITA, Satoshi HANAKI, 内田 仁, 山下 正人, 花木 聡, 香川 博行

المصدر: 材料 / Journal of the Society of Materials Science, Japan. 2002, 51(11):1223

المؤلفون: Hiroki Matsubara, Makoto Aratono, Takanori Takiue, 松原 弘樹, 瀧上 隆智, 荒殿 誠

المصدر: 熱測定 / Netsu Sokutei. 2008, 35(4):192

المؤلفون: Kazuo SAITO, Keikichi NAKAMURA, Masaya IWAKI, 中村 恵吉, 岩木 正哉, 斎藤 一男

المصدر: 金属表面技術 / Journal of the Metal Finishing Society of Japan. 1988, 39(10):642

المؤلفون: Junichi SHIMOMURA, Kanenaga FUJII, Mamoru SATOU, Masato KIUCHI, Syuzo UEDA, Tatsumi KIMURA, 上田 修三, 下村 順一, 佐藤 守, 木内 正人, 木村 達巳, 藤井 兼榮

المصدر: 金属表面技術 / Journal of the Metal Finishing Society of Japan. 1988, 39(10):630