المؤلفون: Faraz, T., Arts, K., Karwal, S., Knoops, H.C.M., Kessels, W.M.M.

المصدر: Faraz , T , Arts , K , Karwal , S , Knoops , H C M & Kessels , W M M 2019 , ' Energetic Ions during plasma-enhanced atomic layer deposition and their role in tailoring material properties ' , Plasma Sources Science and Technology , vol. 28 , no. 2 , 024002 . https://doi.org/10.1088/1361-6595/aaf2c7

مصطلحات موضوعية: RFEA, atomic layer deposition, displacement energy threshold, ion energy dose, ion energy flux, plasma ALD, substrate biasing

وصف الملف: application/pdf

الاتاحة: https://research.tue.nl/en/publications/5ce09881-cd28-4cf9-8eae-1117630047ef
https://doi.org/10.1088/1361-6595/aaf2c7
https://pure.tue.nl/ws/files/124015807/Faraz_2019_Plasma_Sources_Sci._Technol._28_024002.pdf
http://www.scopus.com/inward/record.url?scp=85063226268&partnerID=8YFLogxK