المؤلفون: Chongyu Wang, Yinyin Chao, Jiujiu Liang, Bing Yan, Xiaohao Wang, Kai Ni, Qian Zhou

المصدر: Advanced Photonics Research, Vol 4, Iss 2, Pp n/a-n/a (2023)

مصطلحات موضوعية: high aspect ratio structures, infrared wire grid polarizer, large-area nanofabrication, polarization imaging systems, structural optimization, Applied optics. Photonics, TA1501-1820, Optics. Light, QC350-467

وصف الملف: electronic resource

Relation: https://doaj.org/toc/2699-9293

URL الوصول: https://doaj.org/article/3af3fe34c25f44529152222f031879b6

المؤلفون: Josip Bobinac, Tobias Reiter, Julius Piso, Xaver Klemenschits, Oskar Baumgartner, Zlatan Stanojevic, Georg Strof, Markus Karner, Lado Filipovic

المصدر: Micromachines; Volume 14; Issue 3; Pages: 665

مصطلحات موضوعية: SF 6 /O 2, plasma etching, high-aspect-ratio structures, 3D integration, mask tapering, mask faceting, mask geometry, modeling and simulation, process TCAD

وصف الملف: application/pdf

Relation: A：Physics; https://dx.doi.org/10.3390/mi14030665

الاتاحة: https://doi.org/10.3390/mi14030665

المؤلفون: Jessl, Sarah, Engelke, Simon, Copic, Davor, Baumberg, Jeremy J, De Volder, Michael

مصطلحات موضوعية: carbon nanotubes, colloidal lithography, chemical vapor deposition, high-aspect ratio structures, submicron pores

وصف الملف: Print-Electronic; application/pdf; application/vnd.openxmlformats-officedocument.wordprocessingml.document

Relation: https://www.repository.cam.ac.uk/handle/1810/323863

الاتاحة: https://www.repository.cam.ac.uk/handle/1810/323863
https://doi.org/10.17863/CAM.71324

المؤلفون: Neha Karekar, Anik Karan, Elnaz Khezerlou, Neela Prajapati, Chelsea D. Pernici, Teresa A. Murray, Mark A. DeCoster

المصدر: Nanomaterials; Volume 9; Issue 9; Pages: 1282

مصطلحات موضوعية: self-assembly, amino acid, copper-containing high-aspect ratio structures (CuHARS), silver nanoparticles, anti-cancer, cystine-capped nanoparticles, functionalization

وصف الملف: application/pdf

Relation: https://dx.doi.org/10.3390/nano9091282

الاتاحة: https://doi.org/10.3390/nano9091282

المؤلفون: Sarah Jessl, Michael De Volder, Simon Engelke, Jeremy J. Baumberg, Davor Copic

المساهمون: Jessl, Sarah [0000-0003-4659-6412], Baumberg, Jeremy J [0000-0002-9606-9488], De Volder, Michael [0000-0003-1955-2270], Apollo - University of Cambridge Repository

المصدر: ACS Applied Nano Materials

مصطلحات موضوعية: Battery (electricity), Fabrication, Materials science, submicron pores, Nanotechnology, 02 engineering and technology, Chemical vapor deposition, Carbon nanotube, engineering.material, 010402 general chemistry, 01 natural sciences, 7. Clean energy, Article, law.invention, chemical vapor deposition, Coating, law, General Materials Science, Porosity, carbon nanotubes, 021001 nanoscience & nanotechnology, 0104 chemical sciences, Anode, Nanopore, colloidal lithography, engineering, 0210 nano-technology, high-aspect ratio structures

وصف الملف: application/pdf; application/vnd.openxmlformats-officedocument.wordprocessingml.document

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::fdb12499360757aa99f528bd5c31e2a3
https://www.repository.cam.ac.uk/handle/1810/323863

المؤلفون: Yim, Jihong

المساهمون: Puurunen, Riikka L., Assoc. Prof., Aalto University, Department of Chemical and Metallurgical Engineering, Finland, Karinen, Reetta, D.Sc. (Tech.), Aalto University, Department of Chemical and Metallurgical Engineering, Finland, Kemian tekniikan korkeakoulu, School of Chemical Technology, Kemian tekniikan ja metallurgian laitos, Department of Chemical and Metallurgical Engineering, Catalysis Research, Aalto-yliopisto, Aalto University

مصطلحات موضوعية: Chemistry, atomic layer deposition, conformality, catalyst, high-aspect-ratio structures

وصف الملف: 73 + app. 127; application/pdf

Relation: Aalto University publication series DOCTORAL THESES; 116/2024; [Publication 1]: Yim, J., Haimi, E., Mäntymäki, M., Kärkäs, V., Bes, R., Arandia, A., Meinander, K., Brüner, P., Grehl, T., Gell, L., Viinikainen, T., Honkala, K., Huotari, S., Karinen, R., Putkonen, M, and Puurunen, R. L., Atomic layer deposition of zinc oxide on mesoporous zirconia using zinc(II) acetylacetonate and air, Chemistry of Materials, 35 (2023) 7915–7930. Full text in Acris/Aaltodoc: https://urn.fi/URN:NBN:fi:aalto-202312117215. DOI:10.1021/acs.chemmater.3c00668; [Publication 2]: Arandia, A., Yim, J., Warraich, H., Leppäkangas, E., Bes, R., Lempelto, A., Gell, L., Jiang, H., Meinander, K., Viinikainen, T., Huotari, S., Honkala, K., and Puurunen, R. L., Effect of atomic layer deposited zinc promoter on the activity of copper-on-zirconia catalysts in the hydrogenation of carbon dioxide to methanol, Applied Catalysis B: Environmental, 321 (2023) 122046. Full text in Acris/Aaltodoc: https://urn.fi/URN:NBN:fi:aalto-202211096455. DOI:10.1016/j.apcatb.2022.122046; [Publication 3]: Yim, J., Ylivaara, O. M. E., Ylilammi, M., Korpelainen, V., Haimi, E., Verkama, E., Utriainen, M., and Puurunen, R. L., Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels, Physical Chemistry Chemical Physics, 22 (2020) 23107-23120. DOI:10.1039/D0CP03358H; [Publication 4]: Yim, J., Verkama, E., Velasco, J.A., Arts, K., and Puurunen, R. L., Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile, Physical Chemistry Chemical Physics, 24 (2022) 8645-8660. Full text in Acris/Aaltodoc: https://urn.fi/URN:NBN:fi:aalto-202205042992. DOI:10.1039/D1CP04758B; 1799-4942 (electronic); 1799-4934 (printed); 1799-4934 (ISSN-L); https://aaltodoc.aalto.fi/handle/123456789/127771; URN:ISBN:978-952-64-1853-7

الاتاحة: https://aaltodoc.aalto.fi/handle/123456789/127771

المؤلفون: Kia, Alireza, M., Mart, Clemens, Haufe, Nora, Utriainen, Mikko, Puurunen, Riikka L., Weinreich, Wenke

المصدر: Kia , A M , Mart , C , Haufe , N , Utriainen , M , Puurunen , R L & Weinreich , W 2019 , ' Depth spectroscopy analysis of La-doped HfO2 ALD thin films in 3D structures by HAXPES and ToF-SIMS ' , 18th European Conference on Applications of Surface and Interface Analysis (ECASIA) , Dresden , Germany , 15/09/19 - 20/09/19 .

مصطلحات موضوعية: La-doped HfO2, ALD, ToF-SIMS, high aspect ratio structures, hard-XPS, OtaNano

Relation: https://cris.vtt.fi/en/publications/5872da28-ec09-4e15-aaf8-9ce969fd41bb

الاتاحة: https://cris.vtt.fi/en/publications/5872da28-ec09-4e15-aaf8-9ce969fd41bb

المؤلفون: Alireza, M. Kia, Clemens Mart, Nora Haufe, Mikko Utriainen, Puurunen, Riikka L., Wenke Weinreich

المصدر: Kia, A M, Mart, C, Haufe, N, Utriainen, M, Puurunen, R L & Weinreich, W 2019, ' Depth spectroscopy analysis of La-doped HfO2 ALD thin films in 3D structures by HAXPES and ToF-SIMS ', 18th European Conference on Applications of Surface and Interface Analysis (ECASIA), Dresden, Germany, 15/09/19-20/09/19 .
VTT Technical Research Centre of Finland-PURE

مصطلحات موضوعية: ALD, hard-XPS, La-doped HfO2, high aspect ratio structures, OtaNano, ToF-SIMS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dedup_wf_001::085bffff425812e86573226d2f234e11
https://cris.vtt.fi/en/publications/5872da28-ec09-4e15-aaf8-9ce969fd41bb

مصطلحات موضوعية: ALD, hard-XPS, La-doped HfO2, high aspect ratio structures, OtaNano, ToF-SIMS

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___01229::9e3eb3907a2b1220c2290c0de6e1582a
https://cris.vtt.fi/en/publications/5872da28-ec09-4e15-aaf8-9ce969fd41bb

المؤلفون: Puurunen, Riikka, Ylivaara, Oili, Ylilammi, Markku

المصدر: Puurunen , R , Ylivaara , O & Ylilammi , M 2017 , ' Thin film conformality analysis with microscopic all-silicon lateral high aspect ratio structures ' , Joint EuroCVD 21 - Baltic ALD 15 Conference , Linköping , Sweden , 11/06/17 - 14/06/17 .

مصطلحات موضوعية: ALD, atomic layer deposition, conformality analysis, LHAR, lateral high aspect ratio structures

Relation: https://cris.vtt.fi/en/publications/24fb6176-f78c-4ab9-b941-13559c8b3f59

الاتاحة: https://cris.vtt.fi/en/publications/24fb6176-f78c-4ab9-b941-13559c8b3f59

المؤلفون: Ylilammi, Markku

المصدر: Ylilammi , M 2017 , ' Modelling of conformality of Atomic Layer Deposition in lateral high aspect ratio structures ' , Paper presented at 5th Annual seminar of ALD Centre of Excellence, ALDCoE Seminar 2017 , Helsinki , Finland , 30/03/17 .

مصطلحات موضوعية: thin films, conformality, ALD, atomic layer deposition, high aspect ratio structures, mass transfer, diffusion, surface reactions, OtaNano

Relation: https://cris.vtt.fi/en/publications/695596c1-b025-4362-8124-2ab1a1b2572b

الاتاحة: https://cris.vtt.fi/en/publications/695596c1-b025-4362-8124-2ab1a1b2572b

مصطلحات موضوعية: Condensed Matter::Materials Science, conformality, thin films, surface reactions, ALD, atomic layer deposition, mass transfer, diffusion, high aspect ratio structures, OtaNano

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___01229::4743b635ec4c5ed4eba62d717e4ce5c9
https://cris.vtt.fi/en/publications/695596c1-b025-4362-8124-2ab1a1b2572b

مصطلحات موضوعية: lateral high aspect ratio structures, LHAR, ALD, atomic layer deposition, conformality analysis

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___01229::4c034bfe595541118c4ad226bc10b465
https://cris.vtt.fi/en/publications/adf88abf-1578-420d-abc6-9bd775ec3dea

مصطلحات موضوعية: lateral high aspect ratio structures, LHAR, ALD, atomic layer deposition, conformality analysis

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___01229::96c128143ac46d304f31a9e313f183e9
https://cris.vtt.fi/en/publications/24fb6176-f78c-4ab9-b941-13559c8b3f59

مصطلحات موضوعية: conformality, ta213, surface reactions, thin films, ALD, atomic layer deposition, mass transfer, diffusion, high aspect ratio structures

URL الوصول: https://explore.openaire.eu/search/publication?articleId=CSC_________::15986deafa219950e98fd4949ede1d25
http://juuli.fi/Record/0285750517

المؤلفون: Grigoras, Kestutis, Ylivaara, Oili, Gao, Feng, Heikkilä, Mikko J., Mizohata, Kenichiro, Prunnila, Mika, Räisänen, Jyrki, Ritala, Mikko, Leskelä, Markku, Ahopelto, Jouni, Puurunen, Riikka

المصدر: Grigoras , K , Ylivaara , O , Gao , F , Heikkilä , M J , Mizohata , K , Prunnila , M , Räisänen , J , Ritala , M , Leskelä , M , Ahopelto , J & Puurunen , R 2016 , Highly conformal TiN by atomic layer deposition : growth and characterization . in Technical Program & Abstracts . American Vacuum Society (AVS) , 16th International Conference on Atomic Layer Deposition, ALD 2016 , Dublin , Ireland , 24/07/16 .

مصطلحات موضوعية: ALD, Atomic Layer Deposition, TiN, Lateral high-aspect ratio structures, LHAR

Relation: https://cris.vtt.fi/en/publications/16d3d0c6-057c-48b7-85b7-a37ae762df52

الاتاحة: https://cris.vtt.fi/en/publications/16d3d0c6-057c-48b7-85b7-a37ae762df52

مصطلحات موضوعية: Atomic Layer Deposition, LHAR, ALD, TiN, Lateral high-aspect ratio structures

URL الوصول: https://explore.openaire.eu/search/publication?articleId=dris___01229::c1ff3022aa6e674e03bd134a71febedf
https://cris.vtt.fi/en/publications/16d3d0c6-057c-48b7-85b7-a37ae762df52

المؤلفون: Chen, Yining

المساهمون: Kardomateas, George A., Leo, Claudio Di, Zhu, Ting, Rimoli, Julian, Hanagud, Sathyanaraya, Aerospace Engineering

مصطلحات موضوعية: Microfabrication, 3D process, High aspect ratio structures

وصف الملف: application/pdf

Relation: http://hdl.handle.net/1853/66097

الاتاحة: http://hdl.handle.net/1853/66097

المؤلفون: Haiducu, Marius, Sameoto, Dan E., Foulds, Ian G., Johnstone, Robert W., Parameswaran, M. Ash

المساهمون: Computer, Electrical and Mathematical Sciences and Engineering (CEMSE) Division, Electrical Engineering Program, Mechanical Engineering Program, Physical Science and Engineering (PSE) Division

مصطلحات موضوعية: Deep-UV patterning, High-aspect ratio structures, MEMS, Microfluidics, Poly(methyl methacrylate) (PMMA)

Relation: Haiducu, M., Sameoto, D., Foulds, I., Johnstone, R. W., & Parameswaran, A. M. (2012). Bosch-like method for creating high aspect ratio poly(methyl methacrylate) (PMMA) structures. Micromachining and Microfabrication Process Technology XVII. doi:10.1117/12.908690; Micromachining and Microfabrication Process Technology XVII; http://hdl.handle.net/10754/565862

الاتاحة: http://hdl.handle.net/10754/565862
https://doi.org/10.1117/12.908690

المؤلفون: Rota, A., Duong, T.V., Hartwig, T.

مصطلحات موضوعية: injection molding, high aspect ratio structures

Time: 620, 660, 671

Relation: International Workshop on High-Aspect-Ratio Micro-Structure Technology (HARMST) 2001; HARMST '01. Fourth International Workshop on High-Aspect-Ratio Micro-Structure Technology. Book of Abstracts; https://publica.fraunhofer.de/handle/publica/338667

الاتاحة: https://publica.fraunhofer.de/handle/publica/338667