المؤلفون: N. E. Sherstyuk

المصدر: Российский технологический журнал, Vol 10, Iss 2, Pp 28-34 (2022)

مصطلحات موضوعية: ferroelectrics, photonic crystals, piezoresponse force microscopy, focused ion beam etching, Information theory, Q350-390

وصف الملف: electronic resource

Relation: https://www.rtj-mirea.ru/jour/article/view/481; https://doaj.org/toc/2500-316X

URL الوصول: https://doaj.org/article/7e6d5d759e474c6bbe81bf0072b0db9d

المؤلفون: Mototaka Ito¹ Mototaka_Ito@trc.toray.co.jp, Jun Kato²

المصدر: Electronic Device Failure Analysis. Feb2016, Vol. 18 Issue 1, p14-20. 6p.

مصطلحات موضوعية: *FLIP chip technology, *FOCUSED ion beam etching, *SCANNING electron microscopes, *COPPER, *VOIDS (Crystallography), *KIRKENDALL effect

المؤلفون: Petrov, Yu. V., Ubyivovk, E. V., Baraban, A. P.

المصدر: AIP Conference Proceedings; 2019, Vol. 2064 Issue 1, p030012-1-030012-5, 5p

مصطلحات موضوعية: NANOPORES, SILICON nitride, FOCUSED ion beam etching, FOCUSED ion beams, IRRADIATION, HELIUM ions, HYDROFLUORIC acid, TRANSMISSION electron microscopy

المؤلفون: Motte, Jean-François, Galland, Nicolas, Debray, Jérôme, Ferrier, Alban, Goldner, Philippe, Lučić, Nemenja, Zhang, Shuo, Fang, Bess, Coq, Yann Le, Seidelin, Signe

المساهمون: Nanofabrication (NEEL - Nanofab), Institut Néel (NEEL), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes 2016-2019 (UGA 2016-2019 )-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP)-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes 2016-2019 (UGA 2016-2019 ), Nano-Optique et Forces (NEEL - NOF), Laboratoire national de métrologie et d'essais - Systèmes de Référence Temps-Espace (LNE - SYRTE), Systèmes de Référence Temps Espace (SYRTE), Institut national des sciences de l'Univers (INSU - CNRS)-Observatoire de Paris, Université Paris Sciences et Lettres (PSL)-Université Paris Sciences et Lettres (PSL)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Institut national des sciences de l'Univers (INSU - CNRS)-Observatoire de Paris, Université Paris Sciences et Lettres (PSL)-Université Paris Sciences et Lettres (PSL)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS), Cristaux massifs (NEEL - CrisMass), Université Paris Sciences et Lettres (PSL), Sorbonne Université (SU), Institut universitaire de France (IUF), Ministère de l'Education nationale, de l’Enseignement supérieur et de la Recherche (M.E.N.E.S.R.)

المصدر: ISSN: 2153-1196.

مصطلحات موضوعية: Focused-Ion-Beam Etching Techniques, Spectral Hole Burning, Strain- coupling, Rare-earth Doped Crystals, Mechanical Resonators, Optomechanics, Quantum Physics, [PHYS.QPHY]Physics [physics]/Quantum Physics [quant-ph], [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], [PHYS.ASTR]Physics [physics]/Astrophysics [astro-ph]

Relation: info:eu-repo/semantics/altIdentifier/arxiv/2004.03633; ARXIV: 2004.03633; BIBCODE: 2019JMPh.10.1342M

الاتاحة: https://hal.science/hal-02527678
https://hal.science/hal-02527678v1/document
https://hal.science/hal-02527678v1/file/Resonators_JMP_HAL_Arxiv.pdf
https://doi.org/10.4236/jmp.2019.1011088

المؤلفون: Sasaki, Takahiro, Tohmyoh, Hironori

المصدر: Journal of Vacuum Science & Technology: Part B-Nanotechnology & Microelectronics; Nov2018, Vol. 36 Issue 6, pN.PAG-N.PAG, 6p

مصطلحات موضوعية: RESISTANCE heating, FOCUSED ion beam etching, NANOSTRUCTURED materials, CRYSTAL grain boundaries, FOCUSED ion beams, SPUTTER etching, SILVER

المؤلفون: Xue, Huan-Huan, Shen, Wen-Jin, Geng, Wen-Chao, Yin, Xia, Yang, Yue, Guo, Shaojun, Li, Yong-Jun

المصدر: Chemical Communications; 7/4/2018, Vol. 54 Issue 52, p7227-7230, 4p

مصطلحات موضوعية: METAL etching, SILVER nanoparticles, NANOSTRUCTURED materials synthesis, SCANNING probe microscopy, FOCUSED ion beam etching, NANOSTRUCTURES

المؤلفون: Lee, Doo Won, Bhopal, Muhammad Fahad, Lee, Soo Hong

المصدر: AIP Advances; Jun2018, Vol. 8 Issue 6, pN.PAG-N.PAG, 6p

مصطلحات موضوعية: ALUMINUM, SILICON oxide, SCANNING electron microscopy, SURFACE roughness measurement, FOCUSED ion beam etching

المؤلفون: Preda, I.^1,2 ipreda@cells.es, Vivo, A.², Demarcq, F.², Berujon, S.^2,3, Susini, J.², Ziegler, E.²

المصدر: Nuclear Instruments & Methods in Physics Research Section A. May2013, Vol. 710, p98-100. 3p.

مصطلحات موضوعية: *FOCUSED ion beam etching, *SILICON, *MIRRORS, *SURFACES (Physics), *EROSION, *SURFACE roughness, *METROLOGY

المؤلفون: Takahiro Sato, Yoshihisa Orai, Yuya Suzuki, Hiroyuki Ito, Toshiyuki Isshiki, Munetoshi Fukui, Kuniyasu Nakamura, Schamp, C. T.

المصدر: Microscopy; Oct2017, Vol. 66 Issue 5, p337-347, 11p

مصطلحات موضوعية: SILICON carbide, SURFACE morphology, FOCUSED ion beam etching, DIFFRACTION patterns, DISLOCATION arrays

المؤلفون: Pierścińska, Dorota, Pierściński, Kamil, Płuska, Mariusz, Marona, Łucja, Wiśniewski, Przemysław, Perlin, Piotr, Bugajski, Maciej

المصدر: AIP Advances; Jul2017, Vol. 7 Issue 7, p1-10, 10p, 1 Color Photograph, 3 Black and White Photographs, 1 Diagram, 5 Graphs

مصطلحات موضوعية: INDIUM gallium nitride, RESISTANCE heating, FOCUSED ion beam etching

المؤلفون: Mitrofanov, M. I., Levitskii, I. V., Voznyuk, G. V., Tatarinov, E. E., Rodin, S. N., Kaliteevski, M. A., Evtikhiev, V. P.

المصدر: Semiconductors; Jul2018, Vol. 52 Issue 7, p954-956, 3p

مصطلحات موضوعية: GALLIUM nitride, CRYSTAL structure, NANOPHOTONICS, EPITAXY, FOCUSED ion beam etching

المؤلفون: Khivintsev, Y. V., Filimonov, Y. A., Nikitov, S. A.

المصدر: Applied Physics Letters; 2/2/2015, Vol. 106 Issue 5, p1-4, 4p, 1 Diagram, 3 Graphs

مصطلحات موضوعية: YTTRIUM iron garnet, SPIN waves, MICROWAVE devices, MICROFABRICATION, MINIATURE electronic equipment, PHASE shifters, MAGNETIC damping (Mechanics), FOCUSED ion beam etching

المؤلفون: Geiss, Reinhard, Diziain, Séverine, Steinert, Michael, Schrempel, Frank, Kley, Ernst‐Bernhard, Tünnermann, Andreas, Pertsch, Thomas

المصدر: Physica Status Solidi. A: Applications & Materials Science; Oct2014, Vol. 211 Issue 10, p2421-2425, 5p

مصطلحات موضوعية: PHOTONIC crystals, LITHIUM niobate, ION beams, FOCUSED ion beam etching, GALLIUM

المؤلفون: Hong, Sung-Hak, Lee, Nam Hoon, Kang, Won Nam, Lee, Soon-Gul

المصدر: Superconductor Science & Technology; May2014, Vol. 27 Issue 2, p055007-055011, 5p

مصطلحات موضوعية: COUPLING reactions (Chemistry), JOSEPHSON junctions, KIRKENDALL effect, FOCUSED ion beam etching, ELECTRIC admittance

المؤلفون: Hideyuki Watanabe, Ikuya Hanano, Junko Hayase, Kouichi Akahane, Ryushiro Fujita, 早瀬 潤子, 渡邊 幸志, 花野 郁也, 藤田 留士郎, 赤羽 浩一

المصدر: JSAP Annual Meetings Extended Abstracts. 2016, :1242

المؤلفون: Shojiro Miyake, Mei Wang, Jongduk Kim

المصدر: Journal of Nanotechnology; 2014, p1-19, 19p

مصطلحات موضوعية: SILICA nanoparticles, NANOELECTROMECHANICAL systems, NANOFABRICATION, ATOMIC force microscopy, POTASSIUM hydroxide, FOCUSED ion beam etching

المؤلفون: Bess Fang, Philippe Goldner, Nicolas Galland, S. Seidelin, Nemenja Lučić, S. Zhang, J. F. Motte, Alban Ferrier, Yann Le Coq, Jérôme Debray

المساهمون: Nanofab (Nanofab ), Institut Néel (NEEL), Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019])-Institut polytechnique de Grenoble - Grenoble Institute of Technology (Grenoble INP )-Centre National de la Recherche Scientifique (CNRS)-Université Grenoble Alpes [2016-2019] (UGA [2016-2019]), Nano-Optique et Forces (NOF ), Laboratoire national de métrologie et d'essais - Systèmes de Référence Temps-Espace (LNE - SYRTE), Systèmes de Référence Temps Espace (SYRTE), Institut national des sciences de l'Univers (INSU - CNRS)-Observatoire de Paris, Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS)-Institut national des sciences de l'Univers (INSU - CNRS)-Observatoire de Paris, Université Paris sciences et lettres (PSL)-Université Paris sciences et lettres (PSL)-Sorbonne Université (SU)-Centre National de la Recherche Scientifique (CNRS), Cristaux Massifs (CrisMass), Université Paris sciences et lettres (PSL), Sorbonne Université (SU), Institut Universitaire de France (IUF), Ministère de l'Education nationale, de l’Enseignement supérieur et de la Recherche (M.E.N.E.S.R.)

المصدر: Journal of Modern Physics
Journal of Modern Physics, Scientific Research Publishing (SCIRP), 2019, 10 (11), pp.1342-1352. ⟨10.4236/jmp.2019.1011088⟩

مصطلحات موضوعية: Mechanical Resonators, Cantilever, Materials science, FOS: Physical sciences, Applied Physics (physics.app-ph), 01 natural sciences, 7. Clean energy, Crystal, Resonator, [PHYS.QPHY]Physics [physics]/Quantum Physics [quant-ph], Etching (microfabrication), Strain- coupling, Condensed Matter::Superconductivity, 0502 economics and business, 0103 physical sciences, Microscale chemistry, Optomechanics, Quantum Physics, [PHYS.PHYS.PHYS-OPTICS]Physics [physics]/Physics [physics]/Optics [physics.optics], Dopant, 010308 nuclear & particles physics, business.industry, 05 social sciences, Rare-earth Doped Crystals, Focused-Ion-Beam Etching Techniques, Spectral Hole Burning, Physics - Applied Physics, Quantum technology, Optoelectronics, business, [PHYS.ASTR]Physics [physics]/Astrophysics [astro-ph], 050203 business & management, Physics - Optics, Optics (physics.optics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_dedup___::f242132356b365c2f422a14dbd0acc18

مصطلحات موضوعية: МОСГФЭ, MOVPE, метод ионного травления, эпитаксия, газофазная эпитаксия, epitaxy, focused ion beam etching, selective epitaxy, селективная эпитаксия, GaN, vapor phase epitaxy

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::fd44bb624749229fea6c0722044c3f8c

المؤلفون: Ying J, Zhang XW, Yin ZG, Tan HR, Zhang SG, Fan YM, Ying, J, Chinese Acad Sci, Inst Semicond, Key Lab Semicond Mat Sci, Beijing 100083, Peoples R China. xwzhang@semi.ac.cn

مصطلحات موضوعية: High-pressure Synthesis, Vapor-deposition, Nucleation, Emission, Diamond, Growth, 半导体材料, ion beam lithography, vapor-plating, development, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching, plasma ashing, plasma etching, reactive ion etching, reactive sputter etching, rie, sputtering, cathodic sputtering

Relation: JOURNAL OF APPLIED PHYSICS; Ying J; Zhang XW; Yin ZG; Tan HR; Zhang SG; Fan YM.Electrical transport properties of the Si-doped cubic boron nitride thin films prepared by in situ cosputtering,JOURNAL OF APPLIED PHYSICS,2011,109(2):Article no.23716; http://ir.semi.ac.cn/handle/172111/21299

الاتاحة: http://ir.semi.ac.cn/handle/172111/21299

المؤلفون: Zheng J, Zuo YH, Wang W, Tao YL, Xue CL, Cheng BW, Wang QM, Zheng, J, Chinese Acad Sci, Inst Semicond, State Key Lab Integrated Optoelect, A35 QingHua E Rd, Beijing 100083, Peoples R China. zhengjun@semi.ac.cn

مصطلحات موضوعية: Multilayers, Inorganic Compounds, Sputtering, Optical Properties, Doped Si/sio2 Superlattices, Erbium Silicate, Er3++, Luminescence, Films, Photoluminescence, 光电子学, ion beam lithography, photography--films, finite volume method, compounds, inorganic, inorganic chemicals, 溅射, focused ion beam technology, fib etching, fib technology, focused ion beam etching, ion beam applications, ion beam assisted deposition, ibad, ion lithography, ionised cluster beam deposition, ionized cluster beam deposition, sputter etching, ion etching

Relation: MATERIALS RESEARCH BULLETIN; Zheng J; Zuo YH; Wang W; Tao YL; Xue CL; Cheng BW; Wang QM.Efficient 1.53 mu m emission and energy transfer in Si/Er-Si-O multilayer structure,MATERIALS RESEARCH BULLETIN,2011,46(2):262-265; http://ir.semi.ac.cn/handle/172111/21011

الاتاحة: http://ir.semi.ac.cn/handle/172111/21011