المؤلفون: Wen, De Qi, Krek, Janez, Gudmundsson, Jon Tomas, 1965, Kawamura, Emi, Lieberman, Michael A., Zhang, Peng, Verboncoeur, John P.

المصدر: Plasma sources science & technology. 32(6)

مصطلحات موضوعية: electron dynamics, electron-induced secondary electron yield, excited state atoms, low pressure capacitively coupled plasmas, plasma-surface interaction, resonance photons, simulation validation against experiments

وصف الملف: print

URL الوصول: https://urn.kb.se/resolve?urn=urn:nbn:se:kth:diva-331410
https://doi.org/10.1088/1361-6595/acd6b4