المؤلفون: Chao, CW, Wu, YCS, Hu, GR, Feng, MS

المساهمون: 材料科學與工程學系, Department of Materials Science and Engineering

مصطلحات موضوعية: solid phase crystallization, thin-film transistor, metal-induced lateral crystallization, electroless plating and physical vapor deposition

Relation: http://dx.doi.org/10.1143/JJAP.42.1556; http://hdl.handle.net/11536/27991; JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS; WOS:000182892300013

الاتاحة: http://hdl.handle.net/11536/27991
https://doi.org/10.1143/JJAP.42.1556

المؤلفون: Hu, GR, Huang, TJ, Wu, YS

المساهمون: 材料科學與工程學系, Department of Materials Science and Engineering

مصطلحات موضوعية: thin-film transistor, amorphous silicon, polycrystalline silicon, metal-induced crystallization, electroless plating and physical vapor deposition

Relation: http://dx.doi.org/10.1143/JJAP.42.L895; http://hdl.handle.net/11536/27683; JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS; WOS:000184782600006

الاتاحة: http://hdl.handle.net/11536/27683
https://doi.org/10.1143/JJAP.42.L895