نتائج البحث - "chemical-vapor-deposition"

1

Academic Journal

المؤلفون: Niiranen, Pentti¹ (AUTHOR) pentti.niiranen@liu.se, Andersson, Felicia¹ (AUTHOR), Lundin, Daniel¹ (AUTHOR), Ojamäe, Lars¹ (AUTHOR), Pedersen, Henrik¹ (AUTHOR) henrik.pedersen@liu.se

المصدر: Journal of Chemical Physics. 1/21/2025, Vol. 162 Issue 3, p1-9. 9p.

مصطلحات موضوعية: *CHEMICAL models, *CHEMICAL vapor deposition, *VAPOR-plating, *EMISSION spectroscopy, *PLASMA flow, *INDUCTIVELY coupled plasma atomic emission spectrometry

2

Academic Journal

Radiation effects on pure silica and Ge-doped silica core optical fibers and fiber Bragg grating sensors.

المؤلفون: Hu, Wen^1,2 (AUTHOR), Shao, Chongyun^2,3 (AUTHOR), Yu, Chunlei² (AUTHOR), Deng, Lu² (AUTHOR), Ming, Yuzhou^3,4 (AUTHOR), Ye, Qing^2,3 (AUTHOR), Li, Xin² (AUTHOR), Liu, Yinpeng² (AUTHOR), Wei, Mengda² (AUTHOR), He, Dongyu² (AUTHOR), Hu, Lili² (AUTHOR), Li, Si-Yu¹ (AUTHOR) lisiyu@hnu.edu.cn, Pan, Anlian^1,5 (AUTHOR) anlian.pan@hnu.edu.cn, Liao, Meisong² (AUTHOR) liaomeisong@siom.ac.cn

المصدر: Journal of Applied Physics. 1/14/2025, Vol. 137 Issue 2, p1-11. 11p.

مصطلحات موضوعية: *ELECTRON paramagnetic resonance, *CHEMICAL vapor deposition, *SILICA fibers, *REFRACTIVE index, *MEASUREMENT errors, *FIBER Bragg gratings

3

Academic Journal

Wafer bow in diamond heteroepitaxy: Causes, their analytical description, and viable solutions.

المؤلفون: Schreck, Matthias¹ (AUTHOR) matthias.schreck@physik.uni-augsburg.de, Peter, Theodor¹ (AUTHOR)

المصدر: Journal of Applied Physics. 1/7/2025, Vol. 137 Issue 1, p1-12. 12p.

مصطلحات موضوعية: *CHEMICAL vapor deposition, *SUBSTRATES (Materials science), *SEMICONDUCTOR materials, *DISLOCATION density, *DISCONTINUOUS precipitation

4

Academic Journal

Field emission from cylindrical graphene cathodes prepared by chemical vapor deposition and cold rolling.

المؤلفون: Hernandez, Nathaniel^1,2 (AUTHOR), Piovesan Azambuja, Renato¹ (AUTHOR), Cahay, Marc^1,2 (AUTHOR) cahaymm@ucmail.uc.edu, Ludwick, Jonathan³ (AUTHOR), Back, Tyson³ (AUTHOR), Raut, Ayush⁴ (AUTHOR), Marzana, Maliha⁴ (AUTHOR), Kondapalli, Vamsi Krishna Reddy⁴ (AUTHOR), Fang, Qichen⁵ (AUTHOR), Shanov, Vesselin^4,5 (AUTHOR)

المصدر: Journal of Applied Physics. 11/21/2024, Vol. 136 Issue 19, p1-10. 10p.

مصطلحات موضوعية: *COLD rolling, *CHEMICAL vapor deposition, *ELECTRIC conductivity, *FIELD emission, *CYLINDER (Shapes)

5

Academic Journal

Scalable approach for growing hexagonal boron nitride on silicon and its role in III-nitride van der Waals epitaxy.

المؤلفون: Rather, Muzafar Ahmad¹ (AUTHOR), Hsu, Shao-Hsiang¹ (AUTHOR), Lin, Chih-Chieh¹ (AUTHOR), Tien, Yen-Huang¹ (AUTHOR), Wu, Chien-Ting² (AUTHOR), Yu, Tung-Yuan² (AUTHOR), Lin, Kun-Lin² (AUTHOR), Lai, Kun-Yu³ (AUTHOR), Chyi, Jen-Inn¹ (AUTHOR) chyi@ee.ncu.edu.tw

المصدر: Journal of Applied Physics. 11/21/2024, Vol. 136 Issue 19, p1-10. 10p.

مصطلحات موضوعية: *CHEMICAL vapor deposition, *SILICON nitride, *SUBSTRATES (Materials science), *THIN films, *INSULATING materials

6

Academic Journal

High breakdown voltages on pseudo-vertical p–n diodes by selective area growth of GaN on silicon.

المؤلفون: Kaltsounis, Thomas^1,2 (AUTHOR), El Amrani, Mohammed¹ (AUTHOR), Plaza Arguello, David¹ (AUTHOR), El Rammouz, Hala¹ (AUTHOR), Lafossas, Matthieu¹ (AUTHOR), Torrengo, Simona¹ (AUTHOR), Mendizabal, Laurent¹ (AUTHOR), Gueugnot, Alain¹ (AUTHOR), Mariolle, Denis¹ (AUTHOR), Jalabert, Thomas¹ (AUTHOR), Buckley, Julien¹ (AUTHOR), Cordier, Yvon² (AUTHOR), Charles, Matthew¹ (AUTHOR) matthew.charles@cea.fr

المصدر: Journal of Applied Physics. 11/7/2024, Vol. 136 Issue 17, p1-9. 9p.

مصطلحات موضوعية: *METAL organic chemical vapor deposition, *GALLIUM nitride, *BREAKDOWN voltage, *HIGH voltages, *DOPING agents (Chemistry)

7

Academic Journal

Bulk acoustic wave—Solidly mounted resonator with a-SiOCN:H as low-Z material.

المؤلفون: Berger, Claudio¹ (AUTHOR) berger2claudio@gmail.com, Schiek, Maximilian² (AUTHOR), Pandit, Shardul¹ (AUTHOR), Schneider, Michael¹ (AUTHOR), Pfusterschmied, Georg¹ (AUTHOR), Schmid, Ulrich¹ (AUTHOR)

المصدر: Journal of Applied Physics. 10/14/2024, Vol. 136 Issue 14, p1-11. 11p.

مصطلحات موضوعية: *PLASMA-enhanced chemical vapor deposition, *ACOUSTIC surface waves, *ACOUSTIC impedance, *ALUMINUM nitride, *ACOUSTIC filters

8

Academic Journal

Equilibrium densities of intrinsic defects in transition metal diselenides of molybdenum and tungsten.

المؤلفون: Holtzman, Luke N.¹ (AUTHOR), Vargas, Preston Allen^2,3 (AUTHOR), Hennig, Richard G.^2,3 (AUTHOR), Barmak, Katayun¹ (AUTHOR) kb2612@columbia.edu

المصدر: Journal of Chemical Physics. 10/14/2024, Vol. 161 Issue 14, p1-8. 8p.

مصطلحات موضوعية: *THERMAL equilibrium, *CHEMICAL vapor deposition, *POINT defects, *DENSITY functional theory, *TRANSITION metals

9

Academic Journal

Electrical properties and evaluation of band tail states in Mg doped p-type multilayer hBN.

المؤلفون: Marye, Shambel Abate¹ (AUTHOR), Kumar, Ravi Ranjan¹ (AUTHOR), Thao, Le Thi Phuong¹ (AUTHOR), Chung, Chin-Han¹ (AUTHOR), Tumilty, Niall¹ (AUTHOR) ntumilty@nycu.edu.tw

المصدر: Journal of Applied Physics. 9/28/2024, Vol. 136 Issue 12, p1-10. 10p.

مصطلحات موضوعية: *CHEMICAL vapor deposition, *DENSITY of states, *FERMI level, *VALENCE bands, *BINDING energy, *ATMOSPHERIC pressure

10

Academic Journal

TEM investigation of the interface formation during transfer of 3C-SiC(001) layer onto 6H-SiC(0001) wafer.

المؤلفون: Myasoedov, A. V.¹ (AUTHOR) amyasoedov88@gmail.com, Mynbaeva, M. G.¹ (AUTHOR), Lebedev, S. P.¹ (AUTHOR), Priobrazhenskii, S. Iu.¹ (AUTHOR), Amelchuk, D. G.¹ (AUTHOR), Kirilenko, D. A.¹ (AUTHOR), Lebedev, A. A.¹ (AUTHOR)

المصدر: Journal of Applied Physics. 9/21/2024, Vol. 136 Issue 11, p1-9. 9p.

مصطلحات موضوعية: *CHEMICAL vapor deposition, *SUBSTRATES (Materials science), *TRANSMISSION electron microscopy, *DIFFRACTION patterns, *ELECTRON diffraction

11

Academic Journal

Controllable growth of oriented graphene nanostructures on stainless steel using plasma enhanced chemical vapor deposition.

المؤلفون: Jia, Siyu¹ (AUTHOR) jiasiyu@toki.waseda.jp, Kameoka, Jun¹ (AUTHOR), Maeda, Fumihiko² (AUTHOR), Ueda, Kenji¹ (AUTHOR) k-ueda@waseda.jp

المصدر: Journal of Applied Physics. 8/7/2024, Vol. 136 Issue 5, p1-9. 9p.

مصطلحات موضوعية: *CHEMICAL vapor deposition, *ELECTROCHEMICAL apparatus, *STAINLESS steel, *GRAPHENE, *SUPPLY & demand, *PLASMA-enhanced chemical vapor deposition

12

Academic Journal

Controlled growth of asymmetric chiral TeOx for broad-spectrum, high-responsivity and polarization-sensitive photodetection.

المؤلفون: Zhang, Baihui¹ (AUTHOR) zwzhang@csu.edu.cn, Ao, Zhikang¹ (AUTHOR), Zhang, Fen¹ (AUTHOR), Zhong, Jiang¹ (AUTHOR), Zhang, Shunhui¹ (AUTHOR), Liu, Hang² (AUTHOR), Chen, Yinghao¹ (AUTHOR), Xie, Jianing¹ (AUTHOR), Wen, Wenkui¹ (AUTHOR), Wang, Guang³ (AUTHOR), Chen, Peng⁴ (AUTHOR), Yang, Xiangdong⁵ (AUTHOR), Cao, Jinhui⁶ (AUTHOR), Zhong, Mianzeng¹ (AUTHOR), Li, Hongjian¹ (AUTHOR), Zhang, Zhengwei¹ (AUTHOR)

المصدر: Journal of Chemical Physics. 8/28/2024, Vol. 161 Issue 8, p1-8. 8p.

مصطلحات موضوعية: *CHEMICAL vapor deposition, *SPECTRAL sensitivity, *PHOTODETECTORS, *THERMODYNAMICS, *ANISOTROPY

13

Academic Journal

Deep level traps in (010) β-Ga2O3 epilayers grown by metal organic chemical vapor deposition on Sn-doped β-Ga2O3 substrates.

المؤلفون: Dawe, C. A.¹ (AUTHOR) christopher.dawe@postgrad.manchester.ac.uk, Markevich, V. P.¹ (AUTHOR), Halsall, M. P.¹ (AUTHOR), Hawkins, I. D.¹ (AUTHOR), Peaker, A. R.¹ (AUTHOR), Nandi, A.² (AUTHOR), Sanyal, I.² (AUTHOR), Kuball, M.² (AUTHOR)

المصدر: Journal of Applied Physics. 7/28/2024, Vol. 136 Issue 4, p1-8. 8p.

مصطلحات موضوعية: *METAL organic chemical vapor deposition, *ENERGY levels (Quantum mechanics), *ELECTRON emission, *SCHOTTKY barrier diodes, *ELECTRON traps

14

Academic Journal

Annealing behaviors of open spaces and gas desorption in chemical vapor deposited SiO2 studied with monoenergetic positron beams.

المؤلفون: Uedono, Akira¹ (AUTHOR) uedono.akira.gb@u.tsukuba.ac.jp, Hasunuma, Ryu¹ (AUTHOR), Onishi, Koki² (AUTHOR), Kitagawa, Hayato² (AUTHOR), Inoue, Fumihiro² (AUTHOR), Michishio, Koji³ (AUTHOR), Oshima, Nagayasu³ (AUTHOR)

المصدر: Journal of Applied Physics. 7/28/2024, Vol. 136 Issue 4, p1-8. 8p.

مصطلحات موضوعية: *PLASMA-enhanced chemical vapor deposition, *POSITRON beams, *OPEN spaces, *SPATIAL behavior, *DESORPTION

15

Academic Journal

Epitaxial twin coupled microstructure in GeSn films prepared by remote plasma enhanced chemical vapor deposition.

المؤلفون: Jiang, Jiechao¹ (AUTHOR) jiangjc@uta.edu, Chetuya, Nonso Martin¹ (AUTHOR), Ngai, Joseph H.² (AUTHOR), Grzybowski, Gordon J.³ (AUTHOR), Meletis, Efstathios I.¹ (AUTHOR), Claflin, Bruce⁴ (AUTHOR)

المصدر: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-13. 13p.

مصطلحات موضوعية: *PLASMA-enhanced chemical vapor deposition, *CHEMICAL vapor deposition, *METAL-insulator transitions, *EPITAXIAL layers, *THICK films, *BUFFER layers

16

Academic Journal

Grating-Gate AlGaN/GaN Plasmonic Crystals for Terahertz Waves Manipulation.

المؤلفون: Dub, M.¹ (AUTHOR) maksimdub19f94@gmail.com, Sai, P.¹ (AUTHOR), Krajewska, A.¹ (AUTHOR), But, D. B.¹ (AUTHOR), Ivonyak, Yu¹ (AUTHOR), Prystawko, P.¹ (AUTHOR), Kacperski, J.¹ (AUTHOR), Cywiński, G.¹ (AUTHOR), Rumyantsev, S.¹ (AUTHOR), Knap, W.¹ (AUTHOR), Słowikowski, M.² (AUTHOR), Filipiak, M.² (AUTHOR)

المصدر: International Journal of High Speed Electronics & Systems. Dec2024, Vol. 33 Issue 4, p1-13. 13p.

مصطلحات موضوعية: CHEMICAL vapor deposition, PHASE modulation, SUBMILLIMETER waves, COPPER foil, ELECTRON density

17

Academic Journal

Quantitative characterization of occupational sites of implanted P atoms in diamond.

المؤلفون: Nakata, Jyoji¹ (AUTHOR) cm9j-nkt@asahi-net.or.jp, Seki, Yuhei¹ (AUTHOR), Hoshino, Yasushi¹ (AUTHOR) yhoshino@kanagawa-u.ac.jp

المصدر: Journal of Applied Physics. 5/21/2024, Vol. 135 Issue 19, p1-11. 11p.

مصطلحات موضوعية: *DIAMOND thin films, *CHEMICAL vapor deposition, *DEPTH profiling, *IRRADIATION, *DIAMONDS, *ATOMS

18

Academic Journal

Hole and positron interaction with vacancies and p-type dopants in epitaxially grown silicon.

المؤلفون: Isa, Fabio^1,2 (AUTHOR), Schmidt, Javier A.³ (AUTHOR), Aghion, Stefano^2,4 (AUTHOR), Napolitani, Enrico⁵ (AUTHOR), Isella, Giovanni² (AUTHOR), Ferragut, Rafael² (AUTHOR) rafael.ferragut@polimi.it

المصدر: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-8. 8p.

مصطلحات موضوعية: *POSITRON annihilation, *PLASMA-enhanced chemical vapor deposition, *SECONDARY ion mass spectrometry, *POSITRONS, *SEMICONDUCTOR defects, *DOPING agents (Chemistry), *CRYSTAL defects

19

Academic Journal

Plasma-enhanced chemical vapor deposition a-SiOCN:H low-Z thin films for bulk acoustic wave resonators.

المؤلفون: Berger, Claudio¹ (AUTHOR) berger2claudio@gmail.com, Schneider, Michael¹ (AUTHOR), Pfusterschmied, Georg¹ (AUTHOR), Schmid, Ulrich¹ (AUTHOR)

المصدر: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-10. 10p.

مصطلحات موضوعية: *PLASMA-enhanced chemical vapor deposition, *ACOUSTIC resonators, *SOUND waves, *THIN films, *ACOUSTIC surface waves, *ACOUSTIC impedance

20

Academic Journal

Nickel–silicon interfacial adhesion strength measured by laser spallation.

المؤلفون: Yan, Xiao¹ (AUTHOR), Diamond, Jacob M.^2,3,4 (AUTHOR), Fritz, Nathan J.² (AUTHOR), Matsuo, Satoshi² (AUTHOR), Rabbi, Kazi F.¹ (AUTHOR), Zarin, Ishrat¹ (AUTHOR), Miljkovic, Nenad^1,3,5,6 (AUTHOR), Braun, Paul V.^2,3,4 (AUTHOR), Sottos, Nancy R.^2,3,4 (AUTHOR)

المصدر: Journal of Applied Physics. 4/28/2024, Vol. 135 Issue 16, p1-9. 9p.

مصطلحات موضوعية: *CHEMICAL vapor deposition, *NICKEL films, *FINITE element method, *METAL coating, *AMORPHOUS silicon, *SILICON films

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