المؤلفون: Roman R. Khakimov (11507380), Anna G. Chernikova (4746096), Yury Lebedinskii (4633042), Aleksandra A. Koroleva (11507383), Andrey M. Markeev (4746093)

مصطلحات موضوعية: Biophysics, Biochemistry, Neuroscience, Physiology, Biotechnology, Immunology, Developmental Biology, Cancer, Science Policy, Chemical Sciences not elsewhere classified, Physical Sciences not elsewhere classified, leakage currents related, applied electric field, postmetallization annealing applied, 5 , improve retention valuably, different annealing conditions, 1 – 0, 2 , valuable retention improvement, annealing temperature worsened, imprint shift indicates, annealing conditions, retention improvement, annealing temperature, imprint shift, 2 ev, satisfactory retention, retention behavior, work clarifies

Relation: https://figshare.com/articles/journal_contribution/Influence_of_the_Annealing_Temperature_and_Applied_Electric_Field_on_the_Reliability_of_TiN_Hf_sub_0_5_sub_Zr_sub_0_5_sub_O_sub_2_sub_TiN_Capacitors/16712896

الاتاحة: https://doi.org/10.1021/acsaelm.1c00511.s001