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1Conference
المساهمون: Kojima, Yosuke
المصدر: Photomask Japan 2022: XXVIII Symposium on Photomask and Next-Generation Lithography Mask Technology
الاتاحة: http://dx.doi.org/10.1117/12.2640377
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2Conference
المساهمون: Ando, Akihiko
المصدر: Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology
الاتاحة: http://dx.doi.org/10.1117/12.2601771
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3Conference
المساهمون: Renwick, Stephen P., Preil, Moshe E.
المصدر: Photomask Technology 2020
الاتاحة: http://dx.doi.org/10.1117/12.2572021
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4Academic Journal
المصدر: Journal of Micro/Nanopatterning, Materials, and Metrology ; volume 20, issue 01 ; ISSN 2708-8340
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5Periodical
المؤلفون: Ando, Akihiko, Matsui, Kazuaki, Yonemaru, Naoto, Kojima, Yosuke, Nagatomo, Tatsuya, Yamana, Mitsuharu
المصدر: Proceedings of SPIE; August 2021, Vol. 11908 Issue: 1 p119080A-119080A-13, 11788934p
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6Periodical
المؤلفون: Preil, Moshe E., Renwick, Stephen P., Yonemaru, Naoto, Matsui, Kazuaki, Kojima, Yosuke, Nagatomo, Tatsuya, Yamana, Mitsuharu
المصدر: Proceedings of SPIE; October 2020, Vol. 11518 Issue: 1 p115180B-115180B-9, 1036630p