المؤلفون: Hirokazu Fukidome, Maki Suemitsu, Setsuo Nakajima, Tsuyoshi Uehara, Yasutake Toyoshima, Yohei Inayoshi

المصدر: e-Journal of Surface Science and Nanotechnology. 2013, 11:47

المؤلفون: Setsuo Nakajima, Mitsutaka Matsumoto, Tsuyoshi Uehara, Syun Ito, Maki Suemitsu, Shogo Murashige, Hirokazu Fukidome, Yohei Inayoshi, Yasutake Toyosihima

المصدر: ECS Transactions. 25:345-350

مصطلحات موضوعية: Materials science, Carbon film, Chemical engineering, Atmospheric pressure, Plastic film, Plasma, Deposition (chemistry)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::450f0b266cb64c2a0108f6ee969ca097
https://doi.org/10.1149/1.3202672

المؤلفون: Mitsutaka Matsumoto, Setsuo Nakajima, T. Yara, Yohei Inayoshi, Yasutake Toyoshima, Maki Suemitsu, Tsuyoshi Uehara

المصدر: Thin Solid Films. 516:6673-6676

مصطلحات موضوعية: Materials science, Atmospheric pressure, Metals and Alloys, Analytical chemistry, Surfaces and Interfaces, Chemical vapor deposition, engineering.material, Surfaces, Coatings and Films, Electronic, Optical and Magnetic Materials, chemistry.chemical_compound, Surface coating, Polycrystalline silicon, chemistry, Transmission electron microscopy, Plasma-enhanced chemical vapor deposition, Materials Chemistry, Polyethylene terephthalate, engineering, Thin film

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::2640b4587514468fbc9b62f460d8bcc5
https://doi.org/10.1016/j.tsf.2007.11.041

المؤلفون: Setsuo Nakajima, E. Miyamoto, Yasutake Toyoshima, Mitsutaka Matsumoto, Yohei Inayoshi, Tsuyoshi Uehara, Maki Suemitsu, T. Yara

المصدر: Applied Surface Science. 254:6208-6210

مصطلحات موضوعية: Materials science, Atmospheric pressure, Scanning electron microscope, Analytical chemistry, General Physics and Astronomy, Surfaces and Interfaces, General Chemistry, Chemical vapor deposition, Nitride, Atmospheric temperature range, Condensed Matter Physics, Surfaces, Coatings and Films, chemistry.chemical_compound, X-ray photoelectron spectroscopy, Silicon nitride, chemistry, Plasma-enhanced chemical vapor deposition

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::5a0cb2faf10804565ffb8f4bf2a856bd
https://doi.org/10.1016/j.apsusc.2008.02.186

المؤلفون: Yohei Inayoshi, Maki Suemitsu, Setsuo Nakajima, Yasutake Toyoshima, Tsuyoshi Uehara, Mitsutaka Matsumoto

المصدر: MRS Proceedings. 1066

مصطلحات موضوعية: chemistry.chemical_compound, Materials science, Carbon film, chemistry, Atmospheric pressure, Plasma-enhanced chemical vapor deposition, Doping, Polyethylene terephthalate, Analytical chemistry, Deposition (phase transition), Thin film, Layer (electronics)

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::7efd35bab1a22bbc2ab70bc4f8d86cec
https://doi.org/10.1557/proc-1066-a05-05

المؤلفون: Mitsutaka Matsumoto, Yohei Inayoshi, Shogo Murashige, Hirokazu Fukidome, Maki Suemitsu, Setsuo Nakajima, Tsuyoshi Uehara, Yasutake Toyosihima

المصدر: ECS Meeting Abstracts. :2097-2097

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::d39a9ae006d18ecdb33fbec3e64fd0de
https://doi.org/10.1149/ma2009-02/24/2097

المؤلفون: Tsuyoshi Uehara, Setsuo Nakajima, Yohei Inayoshi, Mitsutaka Matsumoto, Maki Suemitsu, Yasutake Toyoshima, Shogo Murashige

المصدر: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures. 27:223

مصطلحات موضوعية: Materials science, Silicon, Atmospheric pressure, Analytical chemistry, chemistry.chemical_element, Substrate (electronics), Chemical vapor deposition, Condensed Matter Physics, chemistry.chemical_compound, chemistry, Silicon nitride, Thin-film transistor, Plasma-enhanced chemical vapor deposition, Deposition (phase transition), Electrical and Electronic Engineering

URL الوصول: https://explore.openaire.eu/search/publication?articleId=doi_________::86554089017e7f50c6118e2e4e70bc57
https://doi.org/10.1116/1.3021039