المؤلفون: Heikkinen, Niko, Lehtonen, Juha, Keskivali, Laura, Yim, Jihong, Shetty, Shwetha, Ge, Yanling, Reinikainen, Matti, Putkonen, Matti

المساهمون: Department of Chemistry, University of Helsinki, HelsinkiALD

مصطلحات موضوعية: ALUMINUM-OXIDE, SURFACE, GROWTH, CYCLE, STABILIZATION, CONFORMALITY, DIFFUSION, COVERAGE, Chemical sciences

وصف الملف: application/pdf

Relation: European Union's Horizon 2020 research and innovation programme, under grant agreement No 768543 (ICO2CHEM project -From industrial CO2 streams to added value FischerTropsch chemicals). M. P. acknowledges funding from the Academy of Finland by the profiling action on Matter and Materials, grant no. 318913. This work was carried out in the E-fuel research project (Dnro 43287/31/2020), with funding from Business Finland. The authors acknowledge all the participating companies during this study.; Heikkinen , N , Lehtonen , J , Keskivali , L , Yim , J , Shetty , S , Ge , Y , Reinikainen , M & Putkonen , M 2022 , ' Modelling atomic layer deposition overcoating formation on a porous heterogeneous catalyst ' , Physical Chemistry Chemical Physics , vol. 24 , no. 34 , pp. 20506-20516 . https://doi.org/10.1039/d2cp02491h; ORCID: /0000-0002-4166-2890/work/155089990; http://hdl.handle.net/10138/572674; 2a0c003f-4929-48eb-90dc-ac054e2e9234; 000842611800001

الاتاحة: http://hdl.handle.net/10138/572674

المؤلفون: Yim, Jihong, Haimi, Eero, Mäntymäki, Miia, Kärkäs, Ville, Bes, René, Gutierrez, Aitor Arandia, Meinander, Kristoffer, Brüner, Philipp, Grehl, Thomas, Gell, Lars, Viinikainen, Tiia, Honkala, Karoliina, Huotari, Simo, Karinen, Reetta, Putkonen, Matti, Puurunen, Riikka L.

المساهمون: Department of Chemistry, HelsinkiALD, Department of Physics, Materials Physics

مصطلحات موضوعية: Chemical sciences, Physical sciences

وصف الملف: application/pdf

Relation: Yim , J , Haimi , E , Mäntymäki , M , Kärkäs , V , Bes , R , Gutierrez , A A , Meinander , K , Brüner , P , Grehl , T , Gell , L , Viinikainen , T , Honkala , K , Huotari , S , Karinen , R , Putkonen , M & Puurunen , R L 2023 , ' Atomic Layer Deposition of Zinc Oxide on Mesoporous Zirconia Using Zinc(II) Acetylacetonate and Air ' , Chemistry of Materials , vol. 35 , no. 19 , 3c00668 , pp. 7915–7930 . https://doi.org/10.1021/acs.chemmater.3c00668; RIS: urn:A2E7BE84529C27EEEBA4B4C636994FD1; ORCID: /0000-0003-4206-1525/work/150687964; ORCID: /0000-0003-0880-0427/work/150691720; ORCID: /0000-0003-4506-8722/work/150698888; ORCID: /0000-0002-4166-2890/work/150700033; http://hdl.handle.net/10138/568911; cb82c892-5d51-4a02-9048-8b55ea816b93; 85175093658; 001122295900001

الاتاحة: http://hdl.handle.net/10138/568911

المؤلفون: Arandia, Aitor, Yim, Jihong, Warraich, Hassaan, Leppäkangas, Emilia, Bes, René, Lempelto, Aku, Gell, Lars, Jiang, Hua, Meinander, Kristoffer, Viinikainen, Tiia, Huotari, Simo, Honkala, Karoliina, Puurunen, Riikka L.

المساهمون: Department of Chemistry, Department of Physics, Materials Physics, Doctoral Programme in Materials Research and Nanosciences, Helsinki In Vivo Animal Imaging Platform (HAIP)

مصطلحات موضوعية: Physical sciences, Atomic layer deposition, Carbon dioxide, Copper, Hydrogenation, Methanol, Zinc oxide

وصف الملف: application/pdf

Relation: Arandia , A , Yim , J , Warraich , H , Leppäkangas , E , Bes , R , Lempelto , A , Gell , L , Jiang , H , Meinander , K , Viinikainen , T , Huotari , S , Honkala , K & Puurunen , R L 2023 , ' Effect of atomic layer deposited zinc promoter on the activity of copper-on-zirconia catalysts in the hydrogenation of carbon dioxide to methanol ' , Applied Catalysis B: Environmental , vol. 321 , 122046 . https://doi.org/10.1016/j.apcatb.2022.122046 , https://doi.org/10.1016/j.apcatb.2022.122046; Bibtex: ARANDIA2022122046; ORCID: /0000-0003-4506-8722/work/131062239; ORCID: /0000-0003-4206-1525/work/131065820; RIS: urn:71B9CA3FA5B6F1F966E803DBA99717F5; http://hdl.handle.net/10138/356244; ec7723d4-75b9-421c-8af2-5ca836a30ad2; 85140323413; 000877563600002

الاتاحة: http://hdl.handle.net/10138/356244

المؤلفون: Järvilehto, Jänis, Velasco, Jorge A., Yim, Jihong, Gonsalves, Christine, Puurunen, Riikka L.

المساهمون: Department of Chemical and Metallurgical Engineering, Catalysis, Aalto-yliopisto, Aalto University

وصف الملف: 22952-22964; application/pdf

Relation: Physical Chemistry Chemical Physics; Volume 25, issue 34; Järvilehto, J, Velasco, J A, Yim, J, Gonsalves, C & Puurunen, R L 2023, ' Simulation of conformality of ALD growth inside lateral channels: comparison between a diffusion-reaction model and a ballistic transport-reaction model ', Physical Chemistry Chemical Physics, vol. 25, no. 34, pp. 22952-22964 . https://doi.org/10.1039/d3cp01829f; PURE UUID: 74a8e5f3-9172-400b-b8b0-34e5cc14792e; PURE ITEMURL: https://research.aalto.fi/en/publications/74a8e5f3-9172-400b-b8b0-34e5cc14792e; PURE LINK: http://www.scopus.com/inward/record.url?scp=85169183917&partnerID=8YFLogxK; PURE FILEURL: https://research.aalto.fi/files/123830957/CHEM_Jarvilehto_et_al_Simulation_of_conformality_2023_PCCP.pdf; https://aaltodoc.aalto.fi/handle/123456789/123911; URN:NBN:fi:aalto-202310116258

الاتاحة: https://aaltodoc.aalto.fi/handle/123456789/123911
https://doi.org/10.1039/d3cp01829f

المؤلفون: Heikkinen, Niko, Lehtonen, Juha, Keskiväli, Laura, Yim, Jihong, Shetty, Shwetha, Ge, Yanling, Reinikainen, Matti, Putkonen, Matti

المصدر: Heikkinen , N , Lehtonen , J , Keskiväli , L , Yim , J , Shetty , S , Ge , Y , Reinikainen , M & Putkonen , M 2022 , ' Modelling atomic layer deposition overcoating formation on a porous heterogeneous catalyst ' , Physical Chemistry Chemical Physics , vol. 24 , no. 34 , pp. 20506-20516 . https://doi.org/10.1039/d2cp02491h

الاتاحة: https://cris.vtt.fi/en/publications/7a64abf1-fc81-4639-9ce0-5d2aa1d29838
https://doi.org/10.1039/d2cp02491h
http://www.scopus.com/inward/record.url?scp=85137004072&partnerID=8YFLogxK

المؤلفون: Yim, Jihong, Verkama, Emma, Velasco, Jorge A., Arts, Karsten, Puurunen, Riikka L.

المصدر: Yim , J , Verkama , E , Velasco , J A , Arts , K & Puurunen , R L 2022 , ' Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile ' , Physical Chemistry Chemical Physics , vol. 24 , no. 15 , pp. 8645–8660 . https://doi.org/10.1039/D1CP04758B

وصف الملف: application/pdf

الاتاحة: https://research.tue.nl/en/publications/eb5892db-c598-4708-9eb9-460e83db52b8
https://doi.org/10.1039/D1CP04758B
https://pure.tue.nl/ws/files/202623101/d1cp04758b.pdf
http://www.scopus.com/inward/record.url?scp=85128192892&partnerID=8YFLogxK

المؤلفون: Haimi, Eero, Ylivaara, Oili M.E., Yim, Jihong, Puurunen, Riikka L.

المصدر: Haimi , E , Ylivaara , O M E , Yim , J & Puurunen , R L 2021 , ' Saturation profile measurement of atomic layer deposited film by X-ray microanalysis on lateral high-aspect-ratio structure ' , Applied Surface Science Advances , vol. 5 , 100102 . https://doi.org/10.1016/j.apsadv.2021.100102

مصطلحات موضوعية: Atomic layer deposition, Characterization techniques development, Lateral high aspect ratio structure, Monte Carlo methods, Saturation profile, X-ray microanalysis

الاتاحة: https://cris.vtt.fi/en/publications/60d93a05-06a5-4a64-a43a-090f213a810e
https://doi.org/10.1016/j.apsadv.2021.100102
http://www.scopus.com/inward/record.url?scp=85116028509&partnerID=8YFLogxK

المؤلفون: Gonsalves, Christine, Velasco, Jorge, Yim, Jihong, Järvilehto, Jänis, Vuorinen, Ville, Puurunen, Riikka

الاتاحة: http://dx.doi.org/10.26434/chemrxiv-2024-83lwd-v2
https://chemrxiv.org/engage/api-gateway/chemrxiv/assets/orp/resource/item/66fa429512ff75c3a1ea1067/original/simulated-conformality-of-atomic-layer-deposition-in-lateral-channels-the-impact-of-the-knudsen-number-on-the-saturation-profile-characteristics.pdf

المؤلفون: Yim, Jihong, Ylivaara, Oili M.E., Ylilammi, Markku, Korpelainen, Virpi, Haimi, Eero, Verkama, Emma, Utriainen, Mikko, Puurunen, Riikka L.

المصدر: Yim , J , Ylivaara , O M E , Ylilammi , M , Korpelainen , V , Haimi , E , Verkama , E , Utriainen , M & Puurunen , R L 2020 , ' Saturation profile based conformality analysis for atomic layer deposition : Aluminum oxide in lateral high-aspect-ratio channels ' , Physical Chemistry Chemical Physics , vol. 22 , no. 40 , pp. 23107-23120 . https://doi.org/10.26434/chemrxiv.12366623.v4 , https://doi.org/10.1039/d0cp03358h

الاتاحة: https://cris.vtt.fi/en/publications/76d5caf5-070b-4dd8-a123-b81fdb435acf
https://doi.org/10.26434/chemrxiv.12366623.v4
http://www.scopus.com/inward/record.url?scp=85094220789&partnerID=8YFLogxK

المؤلفون: Yim, Jihong, Ylivaara, Oili M.E., Ylilammi, Markku, Korpelainen, Virpi, Haimi, Eero, Verkama, Emma, Utriainen, Mikko, Puurunen, Riikka L.

المساهمون: Department of Chemical and Metallurgical Engineering, VTT Technical Research Centre of Finland, Catalysis, Aalto-yliopisto, Aalto University

وصف الملف: application/pdf

Relation: Physical chemistry chemical physics : PCCP; Volume 22, issue 40; Yim , J , Ylivaara , O M E , Ylilammi , M , Korpelainen , V , Haimi , E , Verkama , E , Utriainen , M & Puurunen , R L 2020 , ' Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels ' , Physical chemistry chemical physics : PCCP , vol. 22 , no. 40 , pp. 23107-23120 . https://doi.org/10.1039/d0cp03358h; PURE UUID: 939bbcb0-d634-4749-b8bd-6b250448ded9; PURE ITEMURL: https://research.aalto.fi/en/publications/939bbcb0-d634-4749-b8bd-6b250448ded9; PURE LINK: http://www.scopus.com/inward/record.url?scp=85094220789&partnerID=8YFLogxK; PURE LINK: https://doi.org/10.26434/chemrxiv.12366623.v4; PURE FILEURL: https://research.aalto.fi/files/52773645/d0cp03358h.pdf; https://aaltodoc.aalto.fi/handle/123456789/61754; URN:NBN:fi:aalto-2020113020599

الاتاحة: https://aaltodoc.aalto.fi/handle/123456789/61754
https://doi.org/10.1039/d0cp03358h

المؤلفون: Yim, Jihong, Verkama, Emma, Puurunen, Riikka L.

المصدر: Physical Chemistry Chemical Physics, 24, 8645-8660, (2023-03-17)

مصطلحات موضوعية: atomic layer deposition, diffusion-reaction, thickness profile, saturation profile, conformality, ALD, LHAR, simulation, PillarHall

Relation: https://doi.org/10.1039/D1CP04758B; https://doi.org/10.26434/chemrxiv-2021-2j4n1-v3; https://zenodo.org/communities/ald-saturation-profile-open-data; https://doi.org/10.5281/zenodo.6997242; https://doi.org/10.5281/zenodo.6997243; oai:zenodo.org:6997243

الاتاحة: https://doi.org/10.5281/zenodo.6997243

المؤلفون: Lepikko, Sakari, Ylivaara, Oili M.E., Yim, Jihong, Verkama, Emma, Utriainen, Mikko, Puurunen, Riikka, L., Ras, Robin H.A.

المصدر: Lepikko , S , Ylivaara , O M E , Yim , J , Verkama , E , Utriainen , M , Puurunen , R L & Ras , R H A 2020 , ' Conformality of TMA/H2O and TMA/O3 processes evaluated using lateral high aspect ratio structures ' , AVS 20th International Conference on Atomic Layer Deposition featuring the 7th International Atomic Layer Etching Workshop , 29/06/20 - 1/07/20 .

مصطلحات موضوعية: ALD, conformality

Relation: https://cris.vtt.fi/en/publications/d1905928-ec8d-474a-9362-de52fc4fc6f9

الاتاحة: https://cris.vtt.fi/en/publications/d1905928-ec8d-474a-9362-de52fc4fc6f9

المؤلفون: Yim, Jihong, Ylivaara, Oili M.E., Ylilammi, Markku, Korpelainen, Virpi, Haimi, Eero, Verkama, Emma, Utriainen, Mikko, Puurunen, Riikka, L.

المصدر: Yim , J , Ylivaara , O M E , Ylilammi , M , Korpelainen , V , Haimi , E , Verkama , E , Utriainen , M & Puurunen , R L 2020 , ' Conformality in Aluminum Oxide ALD Process Analyzed using 3rd Generation Silicon Based Lateral High Aspect Ratio Test Structures ' , AVS 20th International Conference on Atomic Layer Deposition featuring the 7th International Atomic Layer Etching Workshop , 29/06/20 - 1/07/20 .

مصطلحات موضوعية: ALD, conformality, LHAR

Relation: https://cris.vtt.fi/en/publications/20b70393-4fbd-4e1e-b88c-8fcdcc398325

الاتاحة: https://cris.vtt.fi/en/publications/20b70393-4fbd-4e1e-b88c-8fcdcc398325

المؤلفون: Yim, Jihong

المساهمون: Puurunen, Riikka L., Assoc. Prof., Aalto University, Department of Chemical and Metallurgical Engineering, Finland, Karinen, Reetta, D.Sc. (Tech.), Aalto University, Department of Chemical and Metallurgical Engineering, Finland, Kemian tekniikan korkeakoulu, School of Chemical Technology, Kemian tekniikan ja metallurgian laitos, Department of Chemical and Metallurgical Engineering, Catalysis Research, Aalto-yliopisto, Aalto University

مصطلحات موضوعية: Chemistry, atomic layer deposition, conformality, catalyst, high-aspect-ratio structures

وصف الملف: 73 + app. 127; application/pdf

Relation: Aalto University publication series DOCTORAL THESES; 116/2024; [Publication 1]: Yim, J., Haimi, E., Mäntymäki, M., Kärkäs, V., Bes, R., Arandia, A., Meinander, K., Brüner, P., Grehl, T., Gell, L., Viinikainen, T., Honkala, K., Huotari, S., Karinen, R., Putkonen, M, and Puurunen, R. L., Atomic layer deposition of zinc oxide on mesoporous zirconia using zinc(II) acetylacetonate and air, Chemistry of Materials, 35 (2023) 7915–7930. Full text in Acris/Aaltodoc: https://urn.fi/URN:NBN:fi:aalto-202312117215. DOI:10.1021/acs.chemmater.3c00668; [Publication 2]: Arandia, A., Yim, J., Warraich, H., Leppäkangas, E., Bes, R., Lempelto, A., Gell, L., Jiang, H., Meinander, K., Viinikainen, T., Huotari, S., Honkala, K., and Puurunen, R. L., Effect of atomic layer deposited zinc promoter on the activity of copper-on-zirconia catalysts in the hydrogenation of carbon dioxide to methanol, Applied Catalysis B: Environmental, 321 (2023) 122046. Full text in Acris/Aaltodoc: https://urn.fi/URN:NBN:fi:aalto-202211096455. DOI:10.1016/j.apcatb.2022.122046; [Publication 3]: Yim, J., Ylivaara, O. M. E., Ylilammi, M., Korpelainen, V., Haimi, E., Verkama, E., Utriainen, M., and Puurunen, R. L., Saturation profile based conformality analysis for atomic layer deposition: aluminum oxide in lateral high-aspect-ratio channels, Physical Chemistry Chemical Physics, 22 (2020) 23107-23120. DOI:10.1039/D0CP03358H; [Publication 4]: Yim, J., Verkama, E., Velasco, J.A., Arts, K., and Puurunen, R. L., Conformality of atomic layer deposition in microchannels: impact of process parameters on the simulated thickness profile, Physical Chemistry Chemical Physics, 24 (2022) 8645-8660. Full text in Acris/Aaltodoc: https://urn.fi/URN:NBN:fi:aalto-202205042992. DOI:10.1039/D1CP04758B; 1799-4942 (electronic); 1799-4934 (printed); 1799-4934 (ISSN-L); https://aaltodoc.aalto.fi/handle/123456789/127771; URN:ISBN:978-952-64-1853-7

الاتاحة: https://aaltodoc.aalto.fi/handle/123456789/127771

المؤلفون: Yim, Jihong, Verkama, Emma, Velasco, Jorge, Arts, Karsten, Puurunen, Riikka

المساهمون: Academy of Finland

الاتاحة: http://dx.doi.org/10.33774/chemrxiv-2021-2j4n1
https://chemrxiv.org/engage/api-gateway/chemrxiv/assets/orp/resource/item/616d444cb564b6478a7b65f6/original/conformality-of-atomic-layer-deposition-in-microchannels-impact-of-process-parameters-on-the-simulated-thickness-profile.pdf

المؤلفون: Ylivaara, Oili M.E., Yim, Jihong, Ylilammi, Markku, Utriainen, Mikko, Puurunen, Riikka, L.

المصدر: Ylivaara , O M E , Yim , J , Ylilammi , M , Utriainen , M & Puurunen , R L 2019 , ' Conformality analysis of the archetype aluminium oxide ALD process in 3rd-generation silicon-based lateral high-aspect-ratio test structures ' , Joint EuroCVD 22 - Baltic ALD 16 conference 2019 , Luxembourg , 24/06/19 - 28/06/19 .

مصطلحات موضوعية: OtaNano

Relation: https://cris.vtt.fi/en/publications/f5e061f9-2c1a-468c-b4c5-8a316107ab88

الاتاحة: https://cris.vtt.fi/en/publications/f5e061f9-2c1a-468c-b4c5-8a316107ab88
https://www.eurocvd-balticald2019.lu

المؤلفون: Verkama, Emma, Yim, Jihong, Piironen, Jonna, Puurunen, Riikka L.

مصطلحات موضوعية: atomic layer deposition, ALD saturation profile

Relation: https://zenodo.org/communities/ald-saturation-profile-open-data; https://doi.org/10.5281/zenodo.4354345; https://doi.org/10.5281/zenodo.4354346; oai:zenodo.org:4354346

الاتاحة: https://doi.org/10.5281/zenodo.4354346

المؤلفون: Frilund, Christian, Kemian tekniikan korkeakoulu, Puurunen, Riikka, Yim, Jihong

مصطلحات الفهرس: G2 Pro gradu, diplomityö

المؤلفون: Yim, Jihong

المساهمون: Frilund, Christian, Kemian tekniikan korkeakoulu, Puurunen, Riikka, Aalto-yliopisto, Aalto University

مصطلحات موضوعية: oxygen permeable membrane, dry pressing method, binder addition, perovskite material

Relation: https://aaltodoc.aalto.fi/handle/123456789/33707; URN:NBN:fi:aalto-201809034832

الاتاحة: https://aaltodoc.aalto.fi/handle/123456789/33707

المؤلفون: Puurunen, Riikka, Ylivaara, Oili

المساهمون: Marles, Jaana, Yim, Jihong, Ylilammi, Markku, Korpelainen, Virpi, Haimi, Eero, Verkama, Emma, Utriainen, Mikko

مصطلحات موضوعية: atomic layer deposition, saturation profile, ALD saturation profile, trimethylaluminium, conformality, ALD, PillarHall(TM), LHAR

Relation: https://doi.org/10.26434/chemrxiv.12366623; https://doi.org/10.1039/D0CP03358H; https://zenodo.org/communities/ald-saturation-profile-open-data; https://doi.org/10.5281/zenodo.3974437; https://doi.org/10.5281/zenodo.3974438; oai:zenodo.org:3974438

الاتاحة: https://doi.org/10.5281/zenodo.3974438